2-Methyl-2-azabicyclo[2.2.1]hept-5-en-3-one | 1116114-80-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯烷类
• 英文名称: 2-Methyl-2-azabicyclo[2.2.1]hept-5-en-3-one
• CAS: 1116114-80-7
• 化学式: C₇H₉NO
• 分子量: 123.155
• InChiKey: AGXNUOXYTYVGRD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  20.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2-Methyl-2-azabicyclo[2.2.1]hept-5-en-3-one 在 Rhodococcus globerulus-amidase (AMI) 作用下， 以 aq. phosphate buffer 为溶剂， 反应 24.0h， 以99%的产率得到
  参考文献：
  名称：

  文斯内酰胺衍生物的对映体互补内酰胺酶的鉴定和应用

  摘要：

  通过对蛋白质晶体结构和氨基酸序列比对的分析，成功鉴定出了对2-氮杂双环[2.2.1] hept-5-en-3-one（Vince内酰胺）的衍生物具有水解活性的四种酶。具有对映体互补活性，对Vince内酰胺及其饱和类似物2-氮杂双环[2.2.1]庚烷-3-酮与来自金黄色链霉菌的非血红素氯过氧化物酶（CPO-T），来自恶臭假单胞菌的环酰亚胺水解酶（CIH），聚酰胺酰胺（诺卡氏菌（Nocardia farcinica）的NfpolyA）和球红球菌（Rhodococcus globerulus）的酰胺酶（AMI）均获得了理想的动力学拆分（E> 200）。内酰胺中酰胺键共振稳定的计算分析与内酰胺的整体反应模式密切相关，后者是环大小和应变的函数。在这项研究中克隆和研究的生物催化剂可能对合成对映纯碳环核苷类似物很感兴趣。

  DOI：

  10.1002/cctc.201402077

文献信息

• Metal-Catalyzed Reactions between 2-Azabicyclo[2.2.1]hept-5-en-3-ones and Arylboronic Acids
  作者：Takumi Abe、Hiroyuki Takeda、Yumi Takahashi、Yoshihisa Miwa、Koji Yamada、Minoru Ishikura

  DOI：10.1002/ejoc.201000135

  日期：2010.6

  Cu- and Rh-catalyzed coupling reactions of 2-azabicyclo[2.2.1]hept-5-en-3-ones (1) with arylboronic acids were successful carried out under microwave irradiation conditions and yielded N-aryl and C-aryl derivatives of 1, respectively.

  Cu-和Rh-催化的2-氮杂双环[2.2.1]hept-5-en-3-ones (1)与芳基硼酸的偶联反应在微波辐射条件下成功进行，得到N-芳基和C-芳基衍生物分别为 1。
• Rhodium-Catalyzed Arylation of 2-Azabicyclo[2.2.1]hept-5-en-3-one with Arylboronic Acids under Microwave Irradiation
  作者：Minoru Ishikura、Takumi Abe、Hiroyuki Takeda、Yumi Takahashi、Yoshihisa Miwa、Koji Yamada

  DOI：10.3987/com-08-11483

  日期：——

  - Rhodium-catalyzed arylation of 2-azabicyclo[2.2.1]hept-5-en-3-one was successfully performed by applying microwave irradiation.

  - 2-azabicyclo[2.2.1]hept-5-en-3-one 的铑催化芳基化通过微波辐射成功进行。
• US20140275118A1
  申请人：——

  公开号：US20140275118A1

  公开（公告）日：2014-09-18
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160077433A1

  公开（公告）日：2016-03-17

  A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R 3 represents a hydrogen atom or a methyl group, and R 4 represents a C 1 to C 24 saturated hydrocarbon group having a fluorine atom where a methylene group may be replaced by an oxygen atom or a carbonyl group; R 7 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom; ring X 1 represents a C 2 to C 36 heterocyclic group containing a nitrogen atom and a carbonyl group, a hydrogen atom contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C 1 to C 24 hydrocarbon, a C 1 to C 12 alkoxyl group, a C 2 to C 4 acyl group, or a C 2 to C 4 acyloxy group, and a methylene group contained in the heterocyclic group may be replaced by an oxygen atom or a carbonyl group.
• US7166614B2
  申请人：——

  公开号：US7166614B2

  公开（公告）日：2007-01-23