triphenylsulfonium 2,4-difluorobenzenesulfonate | 335199-99-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: triphenylsulfonium 2,4-difluorobenzenesulfonate
• 英文别名: 2,4-Difluorobenzenesulfonate;triphenylsulfanium
• CAS: 335199-99-0
• 化学式: C₆H₃F₂O₃S*C₁₈H₁₅S
• 分子量: 456.534
• InChiKey: JXUSKJMIGMQNNU-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  5.65
• 重原子数：
  31
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND
  申请人：SATO Mitsuo

  公开号：US20130045446A1

  公开（公告）日：2013-02-21

  A radiation-sensitive resin composition includes a sulfonium compound represented by a general formula (1), and a first polymer that serves as a base resin. R represents a group represented by a general formula (2). n 1 to n 3 each independently represent an integer of 0 to 5 and n 1 +n 2 +n 3 ≧1. X − represents an anion. The sulfonium compound is preferably a compound represented by a following general formula (1-1).

  一种辐射敏感的树脂组合物，包括一种由通式（1）表示的磺酸盐化合物和作为基础树脂的第一聚合物。其中，R代表由通式（2）表示的基团，n1到n3各自独立地表示0到5的整数，且n1+n2+n3≥1。X-表示阴离子。最好的磺酸盐化合物是由下列通式（1-1）表示的化合物。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030219680A1

  公开（公告）日：2003-11-27

  A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator. The resin comprises a recurring unit of the following formula (I), 1 wherein R 1 is typically a hydrogen atom and the —C (R 5 ) 3 structure is a 2-methyl-2-tricyclodecanyl group, 2-ethyl-2-tricyclodecanyl group, 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 1-methylcyclopentyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group, or 1-ethylcyclohexyl group.

  提供一种适用于化学放大光刻胶的辐射敏感树脂组合物。该组合物包含(A)一种碱不溶或难溶的树脂，但在酸的作用下变得碱溶，以及(B)一种光酸发生剂。该树脂包含以下式(I)的重复单元，其中R1通常是氢原子，而—C(R5)3结构是2-甲基-2-三环己基基团、2-乙基-2-三环己基基团、2-甲基-2-金刚烷基团、2-乙基-2-金刚烷基团、1-甲基环戊基团、1-乙基环戊基团、1-甲基环己基团或1-乙基环己基团。
• Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
  申请人：Miyamatsu Takashi

  公开号：US20060141383A1

  公开（公告）日：2006-06-29

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种亚砜盐化合物，在波长为220纳米或更短的深紫外线下具有优异的透明度，当用作光酸发生剂时，表现出良好的性能平衡，如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物，且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示，其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基，其中R3为一价脂环烃基，R2表示(取代)-烷基或两个或更多的R2基形成环状结构，p为0-7，q为0-6，n为0-3，X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂。
• COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：Ebata Takuma

  公开号：US20100221659A1

  公开（公告）日：2010-09-02

  A compound has a partial structure shown by a following formula (1), wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.

  以下是化合物的部分结构式（1），其中R1代表氢原子或具有1至8个碳原子的取代或未取代的碳氢基团，R2代表具有1至8个碳原子的取代或未取代的碳氢基团，Rf代表氟原子或具有1至4个碳原子的全氟烷基团，L表示从0到4的整数，n表示从0到10的整数，m表示从1到4的整数。
• SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1586570A1

  公开（公告）日：2005-10-19

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or -OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X- indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种锍盐化合物，对波长 220 纳米以下的深紫外线具有优异的透明性，用作光酸发生器时，在灵敏度、分辨率、图案形状、LER 和储存稳定性等方面表现出均衡的优异性能；一种包含该锍盐化合物的光酸发生器；以及一种包含该光酸发生器的正色调辐射敏感树脂组合物。 锍盐化合物如下式（I）所示、 其中 R1 代表卤素原子、烷基、一价脂环烃基、烷氧基或 -OR3 基团，其中 R3 是一价脂环烃基，R2 代表（取代的）烷基或两个或多个 R2 基团形成环状结构，p 是 0-7，q 是 0-6，n 是 0-3，X- 表示磺酸阴离子。 正色调辐射敏感树脂组合物包括 (A) 锍盐化合物的光酸发生器和 (B) 含酸可分解基团的树脂。