bis(4-t-butylphenyl)iodonium 2-trifluoromethylbenzenesulfonate | 229325-98-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis(4-t-butylphenyl)iodonium 2-trifluoromethylbenzenesulfonate
• 英文别名: Bis(4-(tert-butyl)phenyl)iodonium 2-(trifluoromethyl)benzenesulfonate；bis(4-tert-butylphenyl)iodanium;2-(trifluoromethyl)benzenesulfonate
• CAS: 229325-98-8
• 化学式: C₇H₄F₃O₃S*C₂₀H₂₆I
• 分子量: 618.499
• InChiKey: ILYGGWOGJKVSLD-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.02
• 重原子数：
  35
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP
  申请人：Kyowa Hakko Chemical Co., Ltd.

  公开号：EP1661918A1

  公开（公告）日：2006-05-31

  The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O-C-C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).

  本发明提供了一种生产具有由通式（II）表示的基团的化合物的方法：（其中R1、R2和R3可以相同也可以不同，并且分别表示取代或未取代的烷基、取代或未取代的芳基、或取代或未取代的芳基烷基，或者R1和R2可以相互结合形成与相邻碳原子一起的脂环碳氢环，或者R2和R3可以相互结合形成与相邻的O-C-C一起具有取代基的脂环杂环）的方法，该方法包括允许具有羟基的化合物与由通式（I）表示的卤代烷基醚发生反应：（其中R1、R2和R3分别与上述定义相同，X代表卤素原子）。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• PROCESS FOR PRODUCING ETHER COMPOUND
  申请人：Kyowa Yuka Co., Ltd.

  公开号：EP1415968A1

  公开（公告）日：2004-05-06

  The present invention provides the following process for produci ng and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom,    which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.

  本发明提供了以下用于生产等的过程，该过程能够生产醚化合物，该化合物对于化学放大型抗蚀组合物、药物合成中间体、涂料等具有用途，且副反应较少且产率高。一种生产具有由通式（II）表示的基团的醚化合物的方法，其中R1、R2和R3可以相同也可以不同，并表示取代或未取代的烷基、取代或未取代的芳基或取代或未取代的芳基烷基，或者R1和R2与相邻碳原子一起形成环烷基，包括允许具有羟基（包括羧基）的化合物与由通式（I）表示的烯基醚发生反应，其中R1、R2和R3分别具有上述定义的相同含义。