An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
提供一种具有
化学式(1)的醇
铵盐,用作酸扩散
抑制剂,以及包括该酸扩散
抑制剂的
化学增强型抗蚀剂组合物。当通过光刻加工时,该抗蚀剂组合物表现出高灵敏度和优异的光刻性能因素,例如CDU和LWR。