Benzo<1.2-d:3.4-d'>bis<1.3>dioxol-4,5-diol | 56682-71-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并间二氧杂环戊烯类
• 英文名称: Benzo<1.2-d:3.4-d'>bis<1.3>dioxol-4,5-diol
• 英文别名: benzo[1,2-d;3,4-d']bis[1,3]dioxole-4,5-diol；[1,3]Dioxolo[4,5-g][1,3]benzodioxole-4,5-diol
• CAS: 56682-71-4
• 化学式: C₈H₆O₆
• 分子量: 198.132
• InChiKey: JUXCCQSAUOOSTG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  14
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  77.4
• 氢给体数：
  2
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  Benzo<1.2-d:3.4-d'>bis<1.3>dioxol-4,5-diol 以83%的产率得到
  参考文献：
  名称：

  DALLACKER F.; KRAUSE J., J. LIEBIGS ANN. CHEM. , 1975, NO 4, 611-616

  摘要：

  DOI：
• 作为产物：
  描述：

  5-(Benzyloxy)benzo<1.2-d:3.4-d'>bis<1.3>dioxol-4-ol 以92%的产率得到
  参考文献：
  名称：

  DALLACKER F.; KRAUSE J., J. LIEBIGS ANN. CHEM. , 1975, NO 4, 611-616

  摘要：

  DOI：

文献信息

• PROTECTIVE FILM FORMING COMPOSITION HAVING AN ACETAL STRUCTURE
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20200409260A1

  公开（公告）日：2020-12-31

  A protective film-forming composition which protects against a semiconductor wet etching solution, contains a solvent and a compound or polymer thereof containing at least one acetal structure in a molecule thereof, and forms a protective film exhibiting excellent resistance against a semiconductor wet etching solution during the lithographic process when producing semiconductors; a method for producing a resist pattern-equipped substrate which uses the protective film; and a method for producing a semiconductor device.
• PROTECTIVE FILM-FORMING COMPOSITION HAVING ACETAL STRUCTURE AND AMIDE STRUCTURE
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20220026806A1

  公开（公告）日：2022-01-27

  A composition for forming a protective film having excellent resistance to a wet etching solution for semiconductors during a lithographic process in the manufacture of semiconductors; a method of forming a resist pattern using said protective film; and a method for manufacturing a semiconductor device. This composition for forming a protective film against a wet etching solution for semiconductors includes: a compound or polymer which contains at least one among an acetal structure and an amide structure; and a solvent. The polymer is preferably a copolymer of: a compound (a) containing at least one acetal structure in a molecule; and a compound (b) containing at least one amide structure in a molecule.