申请人:——
公开号:US20020103350A1
公开(公告)日:2002-08-01
Surfaces containing high purity silica (silicon dioxide) exhibit high loading potential for nucleic acids.
Formulations containing nucleic acids and materials which mask the electrostatic interactions between the nucleic acids and surfaces are disclosed. By masking the phosphate charges of the nucleic acids, undesired interactions may be minimized or eliminated, thereby allowing the covalent bonding of the nucleic acids to the surface to proceed. The use of such formulations additionally minimizes nonspecific binding of the nucleic acids to the surface. Examples of materials to be included in such formulations include cations, xanthines, hexoses, purines, arginine, lysine, polyarginine, polylysine, and quaternary ammonium salts.
含有高纯度二氧化硅的表面具有很高的核酸负载潜力。
本研究公开了含有核酸的制剂和可掩盖核酸与表面之间静电相互作用的材料。通过掩盖核酸的磷酸电荷,可以最大限度地减少或消除不希望发生的相互作用,从而使核酸与表面的共价键结合得以进行。此外,使用此类制剂还能最大程度地减少核酸与表面的非特异性结合。可包括在此类制剂中的材料包括阳离子、黄嘌呤、己糖、嘌呤、精氨酸、赖氨酸、多精氨酸、多赖氨酸和季铵盐。