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5-Fluoro-bicyclo[2.2.1]hept-2-ene | 694-96-2

中文名称
——
中文别名
——
英文名称
5-Fluoro-bicyclo[2.2.1]hept-2-ene
英文别名
5-Fluorobicyclo[2.2.1]hept-2-ene
5-Fluoro-bicyclo[2.2.1]hept-2-ene化学式
CAS
694-96-2
化学式
C7H9F
mdl
——
分子量
112.147
InChiKey
LFBHYIUTPVORTR-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.9
  • 重原子数:
    8
  • 可旋转键数:
    0
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.71
  • 拓扑面积:
    0
  • 氢给体数:
    0
  • 氢受体数:
    1

文献信息

  • Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
    申请人:——
    公开号:US20030113658A1
    公开(公告)日:2003-06-19
    A novel photoacid generator containing a structure of the following formula (I), 1 wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z 1 and Z 2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.
    提供一种新型光酸发生剂,其含有以下式(I)的结构,其中R是一种具有50重量%或以下含量,硝基,基或氢原子的一价有机基团,Z1和Z2分别是原子或具有1-10个碳原子的线性或支链全氟烷基团。当用于化学增感辐射敏感树脂组成物中时,该光酸发生剂表现出高透明度,相对高的可燃性和无生物积累,并产生具有高酸度,高沸点,适度短的扩散长度在抗蚀涂层中,并且对掩模图案密度的依赖性低的酸。
  • Multilayer film for packaging
    申请人:——
    公开号:US20010014384A1
    公开(公告)日:2001-08-16
    A multilayer film for packaging which is superior in, such as extensible elasticity, ability for adhering onto various surfaces, transparency, clear cutting performance, heat-sealability, resistance to fogging, resistance to break-through and ability for restoring from finger pressing and which comprises outer layers made of the outer layer resin composition (I) or (II) given below and an inner layer made of an inner layer resin composition composed of a higher melting component (III) and a softening component (IV) interposed between the outer layers, wherein the resin composition (I) comprises 59.5-99.5% by weight of (A) an ethylene/&agr;-olefin copolymer component, which is composed of at least one copolymer of ethylene and an &agr;-olefin having 3-20 carbon atoms and which has a melt flow rate (MFR) of 0.1-10 g/10 min. and a density of 0.850 g/cm 3 -0.910 g/cm 3 ; 0-40% by weight of (B) a high-pressure process low density polyethylene having a density of 0.915-0.930 g/cm 3 , and 0.5-10% by weight of (C) an anti-fogging agent, and wherein the resin composition (II) comprises 99.5-90% by weight of (D) an ethylene/vinyl acetate copolymer, which is a copolymer of ethylene and vinyl acetate and has a vinyl acetate content of 10-30% by weight and an MFR of 0.5-30 g/10 min., and 0.5-10% by weight of (C) anti-fogging agent.
    一种用于包装的多层薄膜,具有伸缩弹性、能够附着在各种表面上、透明、易于切割、热封性能、防雾性能、防穿透性和能够从手指按压中恢复等优点,包括由下列外层树脂组分(I)或(II)制成的外层和由高熔点组分(III)和软化组分(IV)组成的内层树脂组分组成的内层,其中树脂组分(I)包括:59.5-99.5重量%的(A)乙烯/α-烯烃共聚物组分,由乙烯和一种具有3-20个碳原子的α-烯烃的至少一种共聚物组成,具有熔融流速(MFR)为0.1-10 g/10 min.和密度为0.850 g/cm3-0.910 g/cm3;0-40重量%的(B)高压过程低密度聚乙烯,密度为0.915-0.930 g/cm3;0.5-10重量%的(C)防雾剂;树脂组分(II)包括:99.5-90重量%的(D)乙烯/醋酸乙烯共聚物,是乙烯醋酸乙烯的共聚物,醋酸乙烯含量为10-30重量%,MFR为0.5-30 g/10 min.;0.5-10重量%的(C)防雾剂。
  • Thermoplastic norbornene resin based optical film
    申请人:——
    公开号:US20040242823A1
    公开(公告)日:2004-12-02
    An optical film is provided, which displays a positive wavelength dependency across the entire wavelength region from 400 to 800 nm, and is capable of imparting a specified retardation to transmitted light with a single sheet of film. The optical film particularly, includes a thermoplastic norbornene-based resin with a specified structure formed of a structural unit (I) which imparts a positive birefringence and a structural unit (II) which imparts a negative birefringence, and which satisfies particular conditions with respect to &Dgr;N I (&lgr;), &Dgr;N II (&lgr;), &Dgr;N I (800) and &Dgr;N II (800) wherein &Dgr;N I (&lgr;) and &Dgr;N II (&lgr;) represent the difference between a refractive index Nx(&lgr;) in an x axis direction at a wavelength &lgr;, and a refractive index Ny(s) in a y axis direction, and &Dgr;N I (800) and &Dgr;N II (800) represent the difference in refractive indexes at a wavelength of 800 nm, and the x axis represents the stretching direction and the y axis represents the in-plane direction perpendicular to the x direction.
    提供了一种光学薄膜,其在整个波长范围从400到800纳米内显示正波长依赖性,并能够通过单张薄膜赋予传输光以指定的延迟。该光学薄膜特别包括一种热塑性诺本烯基树脂,其具有特定的结构,由赋予正双折射的结构单元(I)和赋予负双折射的结构单元(II)组成,并满足与&Dgr;NI(&lgr;)、&Dgr;NII(&lgr;)、&Dgr;NI(800)和&Dgr;NII(800)相关的特定条件,其中&Dgr;NI(&lgr;)和&Dgr;NII(&lgr;)表示在波长&lgr;处x轴方向上的折射率Nx(&lgr;)与y轴方向上的折射率Ny(s)之间的差异,而&Dgr;NI(800)和&Dgr;NII(800)表示在波长为800纳米时的折射率差异,其中x轴代表拉伸方向,y轴代表垂直于x方向的平面方向。
  • Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
    申请人:Miyamatsu Takashi
    公开号:US20060141383A1
    公开(公告)日:2006-06-29
    A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
    一种亚砜盐化合物,在波长为220纳米或更短的深紫外线下具有优异的透明度,当用作光酸发生剂时,表现出良好的性能平衡,如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物,且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示,其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基,其中R3为一价脂环烃基,R2表示(取代)-烷基或两个或更多的R2基形成环状结构,p为0-7,q为0-6,n为0-3,X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂
  • Method for producing an olefin type copolymer having a cyclic structure
    申请人:MARUZEN PETROCHEMICAL CO., LTD.
    公开号:US20020058767A1
    公开(公告)日:2002-05-16
    A method for producing an olefin type copolymer having a cyclic structure, which comprises copolymerizing ethylene (M1) and dicyclopentadiene or tricyclopentadiene (M2), and, as optionally introduced, a cyclic olefin (M3), wherein, as a catalyst, a catalyst comprising a metallocene compound (A) of the following formula [1]: H 2 C(R′ m CP)(R″ n Cp)Mx 2 [1] wherein M is zirconium or hafnium, Cp is a group having a cyclopentadienyl skeleton, each of R′ and R″ is a hydrocarbon group having 1 to 10 carbon atoms, each of two X's which may be the same or different from each other, is a halogen atom, a hydrogen atom, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkylamino group, an alkoxy group, an aryloxy group of the formula —O—Ar—Y p (wherein Ar is an aromatic ring, Y is a halogen atom, a hydrogen atom, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkoxy group, an alkylamino group, a cyano group or a nitro group, and p is an integer of from 1 to 5), a thioalkyl group, or a thioaryl group of the formula —S—Ar—Y p (wherein Ar, Y and p are as defined above), and each of m and n is an integer of from 0 to 4, provided that m and n are not equal, and m+n is an integer of from 3 to 6, and an aluminoxane (B), is used.
    一种制备具有环状结构的烯烃共聚物的方法,包括共聚乙烯(M1)和二环戊二烯或三环戊二烯(M2),以及作为可选引入的环状烯烃(M3),其中,作为催化剂使用以下式子(1)的属茂化合物(A):H2C(R′mCP)(R″nCP)Mx2(1),其中M为,CP为具有环戊二烯基骨架的基团,R′和R″各自为具有1至10个碳原子的碳氢基团,两个X可以相同也可以不同,是卤素原子、氢原子、具有1至20个碳原子的碳氢基团、卤代碳氢基团、烷基基基团、烷氧基、苯氧基(式中Ar为芳香环,Y为卤素原子、氢原子、具有1至20个碳原子的碳氢基团、卤代碳氢基团、烷氧基、烷基基基团、基或硝基,p为1至5的整数),代烷基团或代芳基团(式中Ar、Y和p如上所述),m和n各自为0至4的整数,但m和n不相等,且m+n为3至6的整数,并使用铝烷氧化物(B)。
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