申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0223246A2
公开(公告)日:1987-05-27
A new cephem compound of the formula:
wherein
R' is amino or protected amino,
R2 is hydrogen, hydroxy protective group, lower alkyl, dihalogenated lower alkyl, cyclo(lower)alkenyl, thietanyl, carboxy(lower)alkyl or protected carboxy(lower)alkyl,
R3 is lower alkyl,
R4 and R5 are each hydrogen, lower alkyl, hydroxy (lower)alkyl, lower alkoxy, amino or protected amino,
R6 is COOe, carboxy or protected carboxy,
X⊖ is an anion, and
n is 0 or 1, with certain provisions, processes for their preparation and pharmaceutical compositions containing them. The invention relates also to compounds of the formula
and of the formula
in which Z is an acid residue.
式中 R' 为氨基或保护氨基,R2 为氢、羟基保护基、低级烷基、二卤代低级烷基、环(低)烯基、硫杂环丁基、羧基(低)烷基或保护羧基(低)烷基,R3 为低级烷基,R4 和 R5 分别为氢、低级烷基、羟基(低)烷基、低级烷氧基、氨基或保护氨基,R6 为 COOe、羧基或保护羧基,X⊖ 为阴离子,n 为 0 或 1。 本发明还涉及式中和式中 Z 为酸残基的化合物。