bis(diphenyltin iodide)propane | 827599-55-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis(diphenyltin iodide)propane
• 英文别名: (Propane-1,3-diyl)bis[iodo(diphenyl)stannane]；iodo-[3-[iodo(diphenyl)stannyl]propyl]-diphenylstannane
• CAS: 827599-55-3
• 化学式: C₂₇H₂₆I₂Sn₂
• 分子量: 841.732
• InChiKey: CUUNNQRBZVEJQM-UHFFFAOYSA-L

计算性质

• 辛醇/水分配系数(LogP)：
  5.77
• 重原子数：
  31
• 可旋转键数：
  8
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  bis(diphenyltin iodide)propane 以 甲醇 、 水 、 乙腈 为溶剂， 生成 [Ph2Sn(CH2)3SnPh2(OH)](O3SCF3)
  参考文献：
  名称：

  低聚亚甲基桥连的双核三有机三氟甲磺酸酯和二苯基次膦酸酯。[Ph 2 Sn（CH 2）n SnPh 2 X]（O 3 SCF 3）（X = OH，O 2 PPh 2 ; n = 1-3）的固态离子对和溶液中的电解解离

  摘要：

  的缩合[PH 2（OH）的Sn（CH 2）ñ的Sn（OH）PH 2 ]（1 - 3 ; ñ = 1-3）与HO 3 SCF 3和HO 2 PPH 2提供[PH 2的Sn（CH 2）ñ SnPh 2（OH）]（O 3 SCF 3）（4 - 6 ; ñ = 1-3）和[PH 2（O 2 PPH 2）的Sn（CH 2）ñ的Sn（O 2PPH 2）PH 2 ]（10 - 12 ; ñ = 1-3），分别。的反应[PH 2的Sn（CH 2）Ñ SnPh 2（OH）]（O 3 SCF 3）（4 - 6 ; ñ = 1-3）与HO 2 PPH 2及NaO 2 PPH 2就产生了形成的[Ph 2 Sn（CH 2）n SnPh 2（O 2 PPh 2）]（O 3 SCF3）（7 - 9 ; ñ = 1-3）和[PH 2（OH）的Sn（CH 2）Ñ（O锡2 PPH 2 PH）2（] 13 - 15 ; ñ =

  DOI：

  10.1021/om049773c
• 作为产物：
  描述：

  bis(triphenyltin)propane 在 碘 作用下， 以 苯 为溶剂， 生成 bis(diphenyltin iodide)propane
  参考文献：
  名称：

  [EN] LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AND/OR MAKING SEMICONDUCTOR DEVICES
  [FR] COMPOSITIONS DE LITHOGRAPHIE ET PROCÉDÉS DE FORMATION DE MOTIFS DE RÉSINE PHOTOSENSIBLE ET/OU DE FABRICATION DE DISPOSITIFS À SEMI-CONDUCTEUR

  摘要：

  The present disclosure relates to compounds and use thereof as film or lithographic compositions such as EUV photoresist films. More particularly, embodiments of the disclosure provide lithography compositions and methods of depositing radiation sensitive films, which can be used for patterning applications with UV light, EUV light or electron-beam radiation to form high resolution patterns with low line width roughness. In embodiments, novel ligands are provided for forming radiation sensitive film compositions.

  公开号：

  WO2023158848A2

文献信息

• Unsymmetrical Bicentric Organotin Lewis Acids {Me₂N(CH₂)₃}Ph(X)Sn(CH₂)_<i>n</i>SnPh₂X (X = F, I; <i>n</i> = 1, 3): Syntheses and Structures
  作者：Nour Alashkar、Christina Dietz、Samer Baba Haj、Wolf Hiller、Klaus Jurkschat

  DOI：10.1021/acs.organomet.6b00500

  日期：2016.8.22

  The syntheses of the intramolecularly coordinated organotin compounds Me2N(CH2)(3)}Ph(X)SnCH2SnPh2X (3, X = I; 4, X = F) and Me2N(CH2)(3)}Ph(F)Sn(CH2)(3)SnPh2F (7) are reported. The compounds have been characterized by elemental analysis, electrospray mass spectrometry, H-1,H-1 DOSY (4), C-13, F-19, and Sn-119 NMR spectroscopy, and single-crystal X-ray diffraction analysis. In the solid state, compound 4 is a head-to-tail dimer as a result of unsymmetrical Sn-F-Sn bridges, whereas compound 7 is a monomer with F -> Sn intramolecular coordination, giving a six-membered ring. In solution, both 4 and 7 are monomeric. The reactions of both 4 and 7 with fluoride anion temperature F-19 and Sn-119 NMR spectroscopy.
• WO2023/86682
  申请人：——

  公开号：——

  公开（公告）日：——
• Oligomethylene-Bridged Dinuclear Triorganotin Triflates and Diphenylphosphinates. Ion Pairing in the Solid State and Electrolytic Dissociation in Solution of [Ph₂Sn(CH₂)<i>_n</i>SnPh₂X](O₃SCF₃) (X = OH, O₂PPh₂; <i>n</i> = 1−3)
  作者：Jens Beckmann、Dainis Dakternieks、Andrew Duthie、Cassandra Mitchell

  DOI：10.1021/om049773c

  日期：2004.12.1

  n = 1−3) with HO3SCF3 and HO2PPh2 provided [Ph2Sn(CH2)nSnPh2(OH)](O3SCF3) (4−6; n = 1−3) and [Ph2(O2PPh2)Sn(CH2)nSn(O2PPh2)Ph2] (10−12; n = 1−3), respectively. The reaction of [Ph2Sn(CH2)nSnPh2(OH)](O3SCF3) (4−6; n = 1−3) with HO2PPh2 and NaO2PPh2 gave rise to the formation of [Ph2Sn(CH2)nSnPh2(O2PPh2)](O3SCF3) (7−9; n = 1−3) and [Ph2(OH)Sn(CH2)nSn(O2PPh2)Ph2] (13−15; n = 1−3), respectively. In the

  的缩合[PH 2（OH）的Sn（CH 2）ñ的Sn（OH）PH 2 ]（1 - 3 ; ñ = 1-3）与HO 3 SCF 3和HO 2 PPH 2提供[PH 2的Sn（CH 2）ñ SnPh 2（OH）]（O 3 SCF 3）（4 - 6 ; ñ = 1-3）和[PH 2（O 2 PPH 2）的Sn（CH 2）ñ的Sn（O 2PPH 2）PH 2 ]（10 - 12 ; ñ = 1-3），分别。的反应[PH 2的Sn（CH 2）Ñ SnPh 2（OH）]（O 3 SCF 3）（4 - 6 ; ñ = 1-3）与HO 2 PPH 2及NaO 2 PPH 2就产生了形成的[Ph 2 Sn（CH 2）n SnPh 2（O 2 PPh 2）]（O 3 SCF3）（7 - 9 ; ñ = 1-3）和[PH 2（OH）的Sn（CH 2）Ñ（O锡2 PPH 2 PH）2（] 13 - 15 ; ñ =
• [EN] LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AND/OR MAKING SEMICONDUCTOR DEVICES<br/>[FR] COMPOSITIONS DE LITHOGRAPHIE ET PROCÉDÉS DE FORMATION DE MOTIFS DE RÉSINE PHOTOSENSIBLE ET/OU DE FABRICATION DE DISPOSITIFS À SEMI-CONDUCTEUR
  申请人：[en]THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK

  公开号：WO2023158848A2

  公开（公告）日：2023-08-24

  The present disclosure relates to compounds and use thereof as film or lithographic compositions such as EUV photoresist films. More particularly, embodiments of the disclosure provide lithography compositions and methods of depositing radiation sensitive films, which can be used for patterning applications with UV light, EUV light or electron-beam radiation to form high resolution patterns with low line width roughness. In embodiments, novel ligands are provided for forming radiation sensitive film compositions.