2-Methyl-9-anthracenacrylsaeure | 52978-91-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 2-Methyl-9-anthracenacrylsaeure
• 英文别名: (E)-3-anthracen-9-yl-2-methylprop-2-enoic acid
• CAS: 52978-91-3
• 化学式: C₁₈H₁₄O₂
• 分子量: 262.308
• InChiKey: NEGSWOUOKZOWDN-ZRDIBKRKSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  20
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.06
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND
  申请人：SATO Mitsuo

  公开号：US20120258402A1

  公开（公告）日：2012-10-11

  A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R 1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR 2 R 3 (OR 4 ), and R 2 to R 4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R 3 and R 4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R 3 and an oxygen atom bonded to R 4 .

  一种光阻剂组合物包括一个聚合物，该聚合物包括下式（1）所示的结构单元，以及一个光酸发生剂。在式（1）中，R1代表氢原子、氟原子、甲基基团或三氟甲基基团，Z代表与与X键合的碳原子一起形成具有3到20个碳原子的二价脂环族基团，X代表具有1到6个碳原子的脂肪二基基团，Y代表氢原子或—CR2R3(OR4)，R2到R4独立地代表氢原子或一价烃基团，其中R3和R4可选择地相互键合以与与R3键合的碳原子和与R4键合的氧原子一起形成环状醚结构。
• [EN] TRIPTYCENE DERIVATIVES FOR NUCLEIC ACID JUNCTION STABILIZATION<br/>[FR] DÉRIVÉS DE TRIPTYCÈNE POUR STABILISER DES JONCTIONS D'ACIDE NUCLÉIQUE
  申请人：UNIV PENNSYLVANIA

  公开号：WO2017053982A1

  公开（公告）日：2017-03-30

  The present invention is directed to compositions and methods using triptycene derivatives (TCDs) for three way junctions (TWJs).

  本发明涉及使用三苯基衍生物（TCDs）用于三路交叉点（TWJs）的组合物和方法。
• Functionalized Photoreactive Compounds
  申请人：Cherkaoui Mohammed Zoubair

  公开号：US20080274304A1

  公开（公告）日：2008-11-06

  The present invention concerns functionalized photoreactive compounds of formula (I), that are particularly useful in materials for the alignment of liquid crystals. Due to the adjunction of an electron withdrawing group to specific molecular systems bearing an unsaturation directly attached to two unsaturated ring systems, exceptionally high photosensitivities, excellent alignment properties as well as good mechanical robustness could be achieved in materials comprising said functionalized photoreactive compounds of the invention.

  本发明涉及式(I)的官能化光反应化合物，特别适用于液晶对准材料。由于在特定分子系统中的不饱和键直接连接到两个不饱和环系统上附加了一个电子受体基团，因此在包含本发明的这些官能化光反应化合物的材料中可以实现异常高的光敏性、优异的对准性能以及良好的机械稳健性。
• Storage stability of photoinitiators
  申请人：Ulrich Thomas

  公开号：US20060100298A1

  公开（公告）日：2006-05-11

  Compounds of formula (I), wherein R 1 is hydrogen or alkyl; R 2 is C 1 -C 4 alkoxy or a morpholino radical; and R 3 is hydrogen or C 1 -C 4 alkoxy, are suitable for improving the solubility of specific photoinitiators in formulations and accordingly enhance the storage stability of formulations comprising a photoinitiator and compounds of formula (I).

  公式(I)的化合物，其中R1为氢或烷基；R2为C1-C4烷氧基或吗啡基；R3为氢或C1-C4烷氧基，适用于提高特定光引发剂在配方中的溶解度，从而增强包含光引发剂和公式(I)化合物的配方的储存稳定性。
• PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20130224661A1

  公开（公告）日：2013-08-29

  A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.

  一种形成图案的方法包括在基板上涂覆辐射敏感的树脂组合物以提供抗蚀膜。抗蚀膜被曝光。曝光的抗蚀膜被显影。用于显影曝光的抗蚀膜的显影剂溶液包括不少于80%的有机溶剂。辐射敏感的树脂组合物包括第一聚合物和辐射敏感的酸发生剂。第一聚合物包括具有酸不稳定基团和脂环族基团的第一结构单元。脂环族基团能够通过酸的作用避免从分子链中解离。