1,2,4-tris-methanesulfonyloxy-benzene | 145106-50-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,2,4-tris-methanesulfonyloxy-benzene
• 英文别名: 1,2,4-Tris-methansulfonyloxy-benzol；[3,4-Bis(methylsulfonyloxy)phenyl] methanesulfonate
• CAS: 145106-50-9
• 化学式: C₉H₁₂O₉S₃
• 分子量: 360.387
• InChiKey: XKLHYWFVMNOSKU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  21
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  155
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  1,2,4-苯三酚 、 甲基磺酰氯 在 吡啶 作用下， 生成 1,2,4-tris-methanesulfonyloxy-benzene
  参考文献：
  名称：

  Helferich; Papalambrou, Justus Liebigs Annalen der Chemie, 1942, vol. 551, p. 235,241

  摘要：

  DOI：

文献信息

• Acid-degradable resin compositions containing ketene-aldehyde copolymer
  申请人：Sudo Atsushi

  公开号：US20050130057A1

  公开（公告）日：2005-06-16

  It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R 1 and R 2 independently represent hydrogen atom, halogen atom, C 1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R 4 group, S(O) n R 4 group, P(═O)(R 4 ) 2 group or M(R 4 ) 3 group; R 3 represents C 1-20 hydrocarbon group or a heterocyclic group: R 4 represents C 1-20 hydrocarbonoxy group, C 1-20 hydrocarbon group, C 1-20 hydrocarbonthio group or mono- or di-C 1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2 , and an acid or a compound capable of generating an acid in response to an external stimulus.

  本发明旨在提供用于制备高灵敏度和高分辨率细微图案的抗蚀剂等组合物，通过增加曝光部分和未曝光部分之间的溶解度差异。可降解酸性组合物包含具有以下通式（I）所表示的重复单元的聚合物：其中，R1和R2独立地表示氢原子、卤素原子、C1-20碳氢基团、杂环基团、氰基团、硝基团、C（═O）R4基团、S（O）nR4基团、P（═O）（R4）2基团或M（R4）3基团；R3表示C1-20碳氢基团或杂环基团；R4表示C1-20碳氢氧基团、C1-20碳氢基团、C1-20碳氢硫基团或单烷基或二烷基氨基基团；M表示硅、锗、锡或铅原子；n为0、1或2，以及一种酸或能够响应外部刺激产生酸的化合物。
• Resist composition
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20030039920A1

  公开（公告）日：2003-02-27

  This invention relates to a polymer capable of forming an ultra-fine pattern with excellent rectangular shape in a silylated surface resolution process using a chemically amplified type resist composition as single layer or the most upper layer among multiple layers and to a resist composition using the polymer. The said polymer and resist composition are useful in a silylated surface resolution process, and by conducting the silylated surface resolution process using the said resist composition, contrast of silylation becomes higher and it becomes possible to obtain ultra-fine pattern regardless of the kind of exposure energy.

  本发明涉及一种聚合物，能够在使用化学增感型抗蚀剂组成的单层或多层中的最上层作为硅化表面分辨率过程中形成具有优异矩形形状的超细图案，并涉及使用该聚合物的抗蚀剂组成物。该聚合物和抗蚀剂组成物在硅化表面分辨率过程中非常有用，通过使用该抗蚀剂组成物进行硅化表面分辨率过程，硅化对比度更高，无论曝光能量的种类如何，都可以获得超细图案。
• ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER
  申请人：NIPPON SODA CO., LTD.

  公开号：EP1482361A1

  公开（公告）日：2004-12-01

  It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(=O)R4 group, S(O)nR4 group, P(=O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di- C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.

  本发明旨在提供用于抗蚀剂等的组合物，通过增大暴露部分和未暴露部分之间的溶解度差异，形成具有高灵敏度和高分辨率的精细图案。可酸性降解组合物含有一种聚合物，其重复单元由以下通式 (I) 表示： 其中 R1 和 R2 分别代表氢原子、卤素原子、C1-20 烃基、杂环基、氰基、硝基、C(＝O)R4 基、S(O)nR4 基、P(＝O)(R4)2 基或 M(R4)3 基；R3 代表 C1-20 烃基或杂环基：R4代表C1-20烃氧基、C1-20烃基、C1-20烃硫基或单-或双-C1-20烃氨基；M代表硅、锗、锡或铅原子；n为0、1或2。
• A resist composition
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1059314B1

  公开（公告）日：2004-12-22
• Resin containing ketene-aldehyde copolymer
  申请人：NIPPON SODA CO., LTD.

  公开号：EP1720063B1

  公开（公告）日：2010-04-07