4-Fluoro-2-(trifluoromethyl)nicotinic acid | 1269291-75-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡啶及其衍生物
• 英文名称: 4-Fluoro-2-(trifluoromethyl)nicotinic acid
• 英文别名: 4-fluoro-2-(trifluoromethyl)pyridine-3-carboxylic acid
• CAS: 1269291-75-9
• 化学式: C₇H₃F₄NO₂
• 分子量: 209.1
• InChiKey: NCANRQRGSDMOIV-UHFFFAOYSA-N

物化性质

• 沸点：
  246.7±40.0 °C(Predicted)
• 密度：
  1.573±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  50.2
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• Conductive material and substrate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10023752B2

  公开（公告）日：2018-07-17

  The present invention provides a conductive material including: (A) a π-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively shown by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more salts selected from the group consisting of a monovalent copper salt of carboxylic acid, a monovalent copper salt of β-diketone, and a monovalent copper salt of β-ketoester. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.

  本发明提供了一种导电材料，包括(A) π-共轭聚合物；(B) 掺杂聚合物，其含有一个或多个如下通式(1)所示分别选自 "a1 "至 "a4 "的重复单元，且其重量平均分子量在 1,000 至 500,000 之间；以及 (C) 一种或多种盐，其选自由羧酸的一价铜盐、β-二酮的一价铜盐和β-酮酯的一价铜盐组成的组。本发明可提供一种导电材料，该材料具有优异的成膜性，并可形成具有高透明度和导电性的导电薄膜，在由该材料形成薄膜时，还具有优异的柔韧性和平整度。
• Resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10222696B2

  公开（公告）日：2019-03-05

  A resist composition comprising a base polymer and a biguanide salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.

  由基质聚合物和双胍盐化合物组成的抗蚀剂组合物在 PPD 上具有较高的溶解对比度、最小的 LWR 和尺寸稳定性。
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120202153A1

  公开（公告）日：2012-08-09

  A resist composition comprising a polymer having recurring units having an acid labile group and recurring units of a magnesium, copper, zinc or cesium salt of (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid copolymerized together exhibits a high resolution, high sensitivity, and minimal LER. The resist composition is best suited as the patterning material for VLSIs and photomasks.
• CONDUCTIVE MATERIAL AND SUBSTRATE
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170130070A1

  公开（公告）日：2017-05-11

  The present invention provides a conductive material including: (A) a π-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively shown by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more salts selected from the group consisting of a monovalent copper salt of carboxylic acid, a monovalent copper salt of β-diketone, and a monovalent copper salt of β-ketoester. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.
• NON-CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION, NON-CHEMICAL AMPLIFICATION TYPE RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20170174801A1

  公开（公告）日：2017-06-22

  Provided are a non-chemical amplification type resist composition in which the resolving power in an isolated line pattern or an isolated space pattern is excellent, and a non-chemical amplification type resist film, a pattern forming method, and a method for manufacturing an electronic device. The non-chemical amplification type resist composition contains a resin (Ab) having a metal salt structure.