1-(2-Ethoxy-ethyl)-pyrrolidon-(2) | 92403-63-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯烷类
• 英文名称: 1-(2-Ethoxy-ethyl)-pyrrolidon-(2)
• 英文别名: 1-(2-ethoxy-ethyl)-pyrrolidin-2-one；N-(b-ethoxyethyl)pyrrolidone；1-(2-ethoxyethyl)pyrrolidin-2-one
• CAS: 92403-63-9
• 化学式: C₈H₁₅NO₂
• 分子量: 157.213
• InChiKey: HUZSCDCNYLZCQH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  11
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  29.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• RESIN COMPOSITION
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20190241716A1

  公开（公告）日：2019-08-08

  The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO) n —; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO) n —; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.

  本发明提供了一种树脂组合物，具有高灵敏度，并用于生产具有低吸水率的固化膜。该树脂组合物包括：(a)可溶于碱的树脂和(b1)含有酚羟基的酰胺酚化合物，其中酚羟基化合物中的单价基在邻位上，和/或(b2)含有羧基的芳香酰胺酸化合物，其中羧基化合物中的单价基在邻位上，其通式如下所示：在通式(1)中，X是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(1)中的羰基碳，或具有—(YO)n—的单价有机基；在通式(2)中，U是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(2)中的酰胺氮，或具有—(YO)n—的单价有机基；其中Y是含有1到10个碳原子的烷基，n是1到20的整数。
• AZA-benzothiophenyl compounds and methods of use
  申请人：Savy Pierre Pascal

  公开号：US20080081821A1

  公开（公告）日：2008-04-03

  The invention relates to azabenzothiophenyl compounds of Formula I with anti-cancer and/or anti-inflammatory activity and more specifically to azabenzothiophenyl compounds which inhibit MEK kinase activity. The invention provides compositions and methods useful for inhibiting abnormal cell growth or treating a hyperproliferative disorder, or treating an inflammatory disease in a mammal. The invention also relates to methods of using the compounds for in vitro, in situ, and in vivo diagnosis or treatment of mammalian cells, or associated pathological conditions.

  本发明涉及一种具有抗癌和/或抗炎活性的Formula I的氮杂苯并噻吩化合物，更具体地，涉及一种抑制MEK激酶活性的氮杂苯并噻吩化合物。本发明提供了用于抑制异常细胞生长或治疗哺乳动物的增殖性疾病或治疗炎症性疾病的组合物和方法。本发明还涉及使用该化合物进行哺乳动物细胞的体外、原位和体内诊断或治疗，或相关病理条件的方法。
• Isoxazole derivatives as peroxisome proliferator-activated receptors agonists
  申请人：Fukui Yoshikazu

  公开号：US20070054902A1

  公开（公告）日：2007-03-08

  A compound of formula (I): (wherein R 1 -R 10 are each independently hydrogen, halogen, optionally substituted lower alkyl or the like, X 1 is —O—, —S—, —NR 11 — (wherein R 11 is hydrogen, lower alkyl or the like), —CR 12 R 13 CO—, —(CR 12 R 13 )mO—, —O(CR 12 R 13 )m- (wherein R 12 and R 13 are each independently hydrogen or lower alkyl and m is a integer between 1 and 3) or the like, X 2 is a bond, —O—, —S—, —NR 14 — (wherein R 14 is hydrogen, lower alkyl or the like, R 14 and R 6 can be taken together with the neighboring atom to form a ring) or —CR 15 R 16 — (wherein R 15 and R 16 are each independently hydrogen or lower alkyl, R 15 and R 6 or R 10 can be taken together with the neighboring carbon atom to form a ring, R 16 and R 9 can be joined together to form a bond), X 3 is COOR 17 , C(═NR 17 )NR 18 OR 19 or the like), a pharmaceutically acceptable salt or a solvate thereof.

  化合物的化学式为（I）：（其中R1-R10各自独立地为氢，卤素，可选择性取代的低碳基或类似物，X1为—O—，—S—，—NR11—（其中R11为氢，低碳基或类似物），—CR12R13CO—，—（CR12R13）mO—，—O（CR12R13）m-（其中R12和R13各自独立地为氢或低碳基，m为1到3之间的整数）或类似物，X2为键，—O—，—S—，—NR14—（其中R14为氢，低碳基或类似物，R14和R6可以与相邻的原子结合形成环）或—CR15R16—（其中R15和R16各自独立地为氢或低碳基，R15和R6或R10可以与相邻的碳原子结合形成环，R16和R9可以结合在一起形成键），X3为COOR17，C（═NR17）NR18OR19或类似物），其药学上可接受的盐或溶剂化物。
• Verfahren zur Reinigung von N-substituierten Lactamen, mit sauren makroporösen Kationenaustauschern
  申请人：BASF AKTIENGESELLSCHAFT

  公开号：EP1038867A1

  公开（公告）日：2000-09-27

  Verfahren zur Reduzierung des Amingehaltes von Amin-verunreinigten N-substituierten Lactamen, indem man die so verunreinigten N-substituierten Lactame mit einem sauren makroporösen Kationenaustauscher behandelt. Insbesondere ein Verfahren zur Reinigung von N-substituierten Lactamen der Formel I in der R einen linearen oder verzweigten, gegebenenfalls substituierten, gesättigten aliphatischen oder cycloaliphatischen Rest darstellt, n eine ganze Zahl von 1 bis 4 bedeutet und wobei der heterocyclische Ring des N-substituierten Lactams inerte Substituenten tragen kann.

  用酸性大孔阳离子交换剂处理受胺污染的 N-取代内酰胺，从而降低胺含量的工艺。 特别是，一种提纯式 I 的 N-取代内酰胺的工艺 其中 R 是线性或支链、任选取代的饱和脂肪族或环脂族自由基，n 是 1 至 4 的整数，N-取代内酰胺的杂环可带有惰性取代基。
• TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (1)
  申请人：Dongwoo Fine-Chem Co., Ltd.

  公开号：EP2605289A2

  公开（公告）日：2013-06-19

  Disclosed herein is an etching composition for texturing a crystalline silicon wafer, comprising, based on a total amount of the composition: (A) 0.1 to 20 wt% of an alkaline compound; (B) 0.1 to 50 wt% of a cyclic compound having a boiling point of 100°C or more; (C) 0.00001 to 10 wt% of a silica-containing compound; and (D) residual water. The etching composition can maximize the absorbance of light of the surface of a crystalline silicon wafer.

  本文公开了一种用于对晶体硅晶片进行纹理处理的蚀刻组合物，以组合物的总量为基准，该组合物包括：(A) 0.1 至 20 wt%的碱性化合物；(B) 0.1 至 50 wt%的沸点为 100°C 或更高的环状化合物；(C) 0.00001 至 10 wt%的含硅化合物；以及 (D) 剩余的水。蚀刻组合物可最大限度地提高晶体硅晶片表面的光吸收率。