Benzolsulfonylmethacryloylimid | 33920-37-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Benzolsulfonylmethacryloylimid
• 英文别名: benzenesulfonyl-methacryloyl-amine；Benzolsulfonyl-methacryloyl-amin；N-(benzenesulfonyl)-2-methylprop-2-enamide
• CAS: 33920-37-5
• 化学式: C₁₀H₁₁NO₃S
• 分子量: 225.268
• InChiKey: NQAWGTOHYUGFGZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  71.6
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  苯磺酰胺 、 甲基丙烯酰氯 在 三乙胺 作用下， 以 二氯甲烷 为溶剂， 生成 Benzolsulfonylmethacryloylimid
  参考文献：
  名称：

  Copper-catalyzed arylsulfonylation of N-arylsulfonyl-acrylamides with arylsulfonohydrazides: synthesis of sulfonated oxindoles

  摘要：

  铜催化的通过串联自由基过程，N-芳磺酰基-丙烯酰胺与磺酰肼的芳基磺酰化反应被开发出来。这一方法学为通过单一操作形成C–S、C–N和C–C键，从而合成磺化吲哚酮提供了替代策略。

  DOI：

  10.1039/c4ob01231c

文献信息

• OXIME ESTER
  申请人：Nishimae Yuichi

  公开号：US20130188270A1

  公开（公告）日：2013-07-25

  Compounds of the formula (I), wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 for example independently of each other are hydro-gen, C 1 -C 20 alkyl, (II), COR 16 or NO 2 , provided that at least one pair of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 , or R 7 and R 8 is (III); R 9 , R 10 , R 11 and R 12 for example independently of each other are hydrogen, C 1 -C 20 alkyl which optionally substituted; or R 9 , R 10 , R 11 , and R 12 independently of each other are unsubstituted or substituted phenyl; X is CO or a direct bond; R 13 is for example C 1 -C 20 alkyl which optionally is substituted, C 2 -C 12 alkenyl, C 4 -C 8 cycloalkenyl, C 2 -C 12 alkinyl, C 3 -C 10 -cycloalkyl, phenyl or naphthyl both of which are optionally substituted; R 14 is for example hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy, C 1 -C 20 alkyl, phenyl or naphthyl; R 15 is for example C 6 -C 20 aryl or C 5 -C 20 heteroaryl; R 16 is for example C 6 -C 20 aryl which is unsubstituted or substituted by one or more C 1 -C 20 alkoxy or C 1 -C 20 alkyl; are in particular suitable as photoinitiators for color filter applications.

  式(I)的化合物，其中R1、R2、R3、R4、R5、R6、R7和R8，例如独立地是氢、C1-C20烷基、(II)、COR16或NO2，条件是至少有一对R1和R2、R2和R3、R3和R4、R5和R6、R6和R7或R7和R8是(III)；R9、R10、R11和R12，例如独立地是氢、C1-C20烷基，可选择地被取代；或者R9、R10、R11和R12独立地是未取代或取代的苯基；X是CO或直接键；R13，例如C1-C20烷基，可选择地被取代，C2-C12烯基，C4-C8环烯基，C2-C12炔基，C3-C10环烷基，苯基或者萘基，两者可选择地被取代；R14，例如氢，C3-C8环烷基，C2-C5烯基，C1-C20烷氧基，C1-C20烷基，苯基或者萘基；R15，例如C6-C20芳基或C5-C20杂芳基；R16，例如C6-C20芳基，未取代或被一个或多个C1-C20烷氧基或C1-C20烷基取代；特别适用于彩色滤光片应用的光引发剂。
• Oxime ester photoinitiators
  申请人：——

  公开号：US20010012596A1

  公开（公告）日：2001-08-09

  Compounds of the formulae I, II, III, IV and V 1 R 1 i.a. is C 4 -C 9 cycloalkanoyl, C 1 -C 12 alkanoyl, C 4 -C 6 alkenoyl, or benzoyl; R 2 is for example phenyl, C 1 -C 20 alkyl, C 3 -C 8 cycloalkyl, C 2 -C 20 alkanoyl, or benzoyl; Ar 1 is R 4 S-phenyl or NR 5 R 6 -phenyl, each of which optionally is substituted; or Ar, i.a. is 2 optionally substituted; or Ar 1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar 1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar 1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar 2 i.a. is 3 optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M 1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M 1 , when x is 3, is a trivalent radical; M 2 for example is 4 M 3 is for example C 1 -C 12 alkylene, cyclohexylene, or phenylene; n is 1-20; R 3 is for example hydrogen or C 1 -C 12 alkyl; R 3 ′ i.a. is C 1 -C 12 alkyl; substituted or -O-interrupted C 2 -C 6 alkyl; R 4 is for example hydrogen, or C 1 -C 12 alkyl; and R 5 and R 6 independently of each other i.a. are hydrogen, C 1 -C 12 alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

  式I、II、III、IV和V1R1i.a.的化合物中，C4-C9环烷酰基、C1-C12脂肪酰基、C4-C6烯酰基或苯甲酰基为例；R2例如为苯基、C1-C20烷基、C3-C8环烷基、C2-C20脂肪酰基或苯甲酰基；Ar1为R4S-苯基或NR5R6-苯基，可以选择地取代；或Ar，例如是可选择地取代的；或Ar1为萘基或蒽基，每个都是未取代或取代的；或Ar1为苯甲酰基、萘基甲酰基、菲甲酰基、蒽甲酰基或芘甲酰基，每个都是未取代或取代的，或Ar1为3,4,5-三甲氧基苯基、苯氧基苯基或联苯基；Ar2i.a.是可选择地取代的，或萘基或蒽基，每个都是未取代或取代的，x为2或3；当x为2时，M1例如为苯基、萘基、蒽基，每个可以选择地取代；当x为3时，M1是三价基团；M2例如为4；M3例如为C1-C12亚烷基、环己亚烷基或苯基；n为1-20；R3例如为氢或C1-C12烷基；R3′ i.a.是C1-C12烷基；取代或-O中断的C2-C6烷基；R4例如为氢或C1-C12烷基；R5和R6独立地为氢、C1-C12烷基或苯基；在特别是光刻应用中，适用作光引发剂。
• Photosensitive resin composition
  申请人：——

  公开号：US20020020832A1

  公开（公告）日：2002-02-21

  Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II 1 wherein R 1 inter alia is C 4 -C 9 cycloalkanoyl, C 3 -C 12 alkenoyl, or benzoyl which is unsubstituted or substituted; Ar 1 is either C 6 -C 20 aryl or C 6 -C 20 aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M 1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR 3 , SR 4 or NR 5 R 6 ; or M 1 , when x is 3, is a trivalent group, optionally substituted; R 3 is for example hydrogen or C 1 -C 12 alkyl; C 2 -C 6 alkyl which is for example substituted by —OH, —SH, —CN, C 3 -C 6 alkenoxy, or —OCH 2 CH 2 CN; R 4 is for example hydrogen, C 1 -C 12 alkyl, C 3 -C 12 alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R 5 and R 6 independently of each other inter alia are hydrogen, C 1 -C 12 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 3 -C 5 alkenyl, C 3 -C 8 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 4 alkanoyl, C 3 -C 6 alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.

  光敏感组合物包括（A）可溶于碱的化合物;（B）至少一种公式I或II1的化合物，其中R1包括C4-C9环烷酰基，C3-C12烯酰基或未取代或取代的苯酰基; Ar1是未取代或取代的C6-C20芳基或C6-C20芳基酰基; x为2或3; 当x为2时，M1包括苯基或萘基，每个基都可以选项地被OR3，SR4或NR5R6取代; 当x为3时，M1是三价基团，可以选项地被取代; R3例如为氢或C1-C12烷基; C2-C6烷基例如被-OH，-SH，-CN，C3-C6烯氧基或-OCH2CH2CN取代; R4例如为氢，C1-C12烷基，C3-C12烯基，环己基或未取代或取代的苯基; R5和R6彼此独立地包括氢，C1-C12烷基，C2-C4羟基烷基，C2-C10烷氧基烷基，C3-C5烯基，C3-C8环烷基，苯基-C1-C3烷基，C1-C4烷酰基，C3-C6烯酰基，苯酰基或未取代或取代的苯基; 和（C）光聚合化合物;在光阻技术中表现出意外的良好性能。
• Ink composition for electrostatic ink-jet recording and method of ink-jet recording
  申请人：Kasai Seishi

  公开号：US20050070630A1

  公开（公告）日：2005-03-31

  An ink composition for electrostatic ink-jet recording comprises: a dispersion medium; and a charged particle comprising a colorant, wherein the charged particle contains at least one of an onium salt compound and an onium salt group-containing polymer. A method of ink jet recording comprises an ink droplet of the ink composition by using an electrostatic field.

  一种用于静电喷墨记录的墨水组合物包括：分散介质；以及包含着色剂的带电粒子，其中所述带电粒子包含至少一种onium盐化合物和onium盐基聚合物中的一种。一种喷墨记录的方法包括使用静电场将墨水组合物的墨滴喷出。
• OXIME ESTER PHOTOINITIATORS
  申请人：Matsumoto Akira

  公开号：US20100086881A1

  公开（公告）日：2010-04-08

  Compounds of the formula (I), wherein A 1 is formula (II); A 2 is formula (III); A 3 is formula (IV); A 4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M 1 , M 2 , M 3 and M 4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R 1 is for example hydrogen, C 1 -C 20 alkyl or phenyl or naphthyl; R 2 and R″ 2 for example are is hydrogen or C 1 -C 20 alkyl; R 3 , R 4 , R′ 3 , R′ 4 , R″ 3 and R″ 4 for example are hydrogen, halogen, phenyl, or C 1 -C 20 alkyl; and R 24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.

  公式(I)化合物，其中A1为公式(II); A2为公式(III); A3为公式(IV); A4为公式(V); w、x、y和z相互独立，均为0-4之间的整数，前提是x+y+z的总和为2-4之间的整数，对应于Q的价态; M1、M2、M3和M4例如为直接键，CO或O; Y例如为直接键或S; Q为(x+y)-价联结基; R1例如为氢、C1-C20烷基或苯基或萘基; R2和R″2例如为氢或C1-C20烷基; R3、R4、R′3、R′4、R″3和R″4例如为氢、卤素、苯基或C1-C20烷基; R24例如为直接键; 在光聚合反应中表现出意外的良好性能。