1,1,1,2,2,3,3,4,4-Nonafluorooctane | 253342-14-2

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 1,1,1,2,2,3,3,4,4-Nonafluorooctane
• CAS: 253342-14-2
• 化学式: F(CF₂)₄(CH₂)₄H
• 分子量: 276.14
• InChiKey: DHVISCLQILVWLM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  17
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• [EN] FLUORINATED PHOSPHONIC ACIDS<br/>[FR] ACIDES PHOSPHONIQUES FLUORES
  申请人：3M INNOVATIVE PROPERTIES CO

  公开号：WO2003102003A1

  公开（公告）日：2003-12-11

  Fluorinated phosphonic acid compounds, useful as treatments for substrate surfaces, have the formula (I) : wherein: R1 is a straight chain alkylene group having from 3 to 21 carbon atoms, an oxa-substituted straight chain alkylene group having from 2 to 20 carbon atoms, or a thia-substituted straight chain alkylene group having from 2 to 20 carbon atoms; R2 is a perfluoroalkyl group having from 4 to 10 carbon atoms; R3 is hydrogen, an alkali metal cation, or an alkyl group having from 1 to 6 carbon atoms; and M is hydrogen or an alkali metal cation, with the proviso that if R1 is an unsubstituted straight chain alkylene group, then the sum of carbon atoms in R1 and R2 combined is at least 10.

  氟磷酸化合物，用作处理基板表面的药物，其化学式为（I）：其中：R1为具有3至21个碳原子的直链烷基基团，具有2至20个碳原子的氧代取代直链烷基基团，或具有2至20个碳原子的硫代取代直链烷基基团；R2为具有4至10个碳原子的全氟烷基基团；R3为氢、碱金属阳离子，或具有1至6个碳原子的烷基基团；M为氢或碱金属阳离子，但如果R1为未取代的直链烷基基团，则R1和R2中碳原子的总和至少为10。
• FLOURINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERNING, PHOTODEGRADABLE COUPLING AGENT, PATTERNING METHOD, AND COMPOUND
  申请人：Kanagawa University

  公开号：US20160152642A1

  公开（公告）日：2016-06-02

  A fluorine-containing compound represented by General formula (1), wherein X represents a halogen atom or an alkoxy group, R 1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, R f1 and R f2 are each independently a fluorinated alkoxy group, and n represents an integer of 0 or more.

  由通用式（1）表示的含氟化合物，其中X代表卤素原子或烷氧基团，R1代表氢原子或具有1至10个碳原子的线性、支链或环烷基团，Rf1和Rf2分别是氟化烷氧基团，n代表大于或等于0的整数。
• Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
  申请人：JSR CORPORATION

  公开号：US10392699B2

  公开（公告）日：2019-08-27

  The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.

  本发明涉及：一种生产具有凹陷图案的结构的方法；一种树脂组合物；一种形成导电薄膜的方法；一种电子电路；以及一种电子设备。生产具有凹陷图案的结构的方法包括以下步骤(i)和(ii)，凹陷图案的薄膜厚度比步骤(i)中获得的涂膜薄 5%至小于 90%： (i) 使用树脂组合物在结构的非平面上形成涂膜的步骤，该树脂组合物包括含酸可分解基团的聚合物和酸生成物；以及 (ii) 通过对涂膜部分的规定部分进行辐射形成凹槽的步骤。
• FLUORINATED PHOSPHONIC ACIDS
  申请人：3M Innovative Properties Company

  公开号：EP1509536A1

  公开（公告）日：2005-03-02
• CHROMOPHORES WITH PERFLUOROALKYL SUBSTITUENTS
  申请人：BASF SE

  公开号：EP2704683B1

  公开（公告）日：2017-10-18