2-[(1-ethoxy)ethoxy]-6-bromonaphthalene | 146781-48-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2-[(1-ethoxy)ethoxy]-6-bromonaphthalene
• 英文别名: 2-Bromo-6-(2-ethoxyethoxy)naphthalene
• CAS: 146781-48-8
• 化学式: C₁₄H₁₅BrO₂
• mdl: MFCD16208630
• 分子量: 295.176
• InChiKey: DLPDFHQOROHQAM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  17
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.285
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-[(1-ethoxy)ethoxy]-6-bromonaphthalene 在 四(三苯基膦)钯 、 正丁基锂 、 sodium carbonate 作用下， 以 四氢呋喃 、 乙二醇二甲醚 、 水 为溶剂， 反应 21.0h， 生成 5-[2-(2-ethoxyethoxy)naphthalen-6-yl]-7-(cyclopropylmethyl)-7H-pyrrolo[2,3-d]pyrimidin-4-amine
  参考文献：
  名称：

  7H-吡咯并[2,3-d]嘧啶-4-胺作为恶性疟原虫钙依赖性蛋白激酶的潜在抑制剂

  摘要：

  直击疟疾痛处：吡咯并[2,3- d ]嘧啶已被设计为针对恶性疟原虫钙依赖性蛋白激酶 4 ( Pf CDPK4) 的潜在抑制剂。合成了在计算机模拟中表现出良好结合相互作用的化合物，并评估了其对Pf CDPK4 和Pf CDPK1 的抑制活性，其中几种化合物对Pf CDPK4 (IC 50 =0.210–0.530 μM) 或Pf CDPK1 (IC 50 =0.589)显示出有希望的抑制活性。微米）。

  DOI：

  10.1002/cmdc.202200421
• 作为产物：
  描述：

  6-溴-2-萘酚 生成 2-[(1-ethoxy)ethoxy]-6-bromonaphthalene
  参考文献：
  名称：

  Optically active compound and photosensitive resin composition

  摘要：

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。

  公开号：

  US20030211421A1

文献信息

• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• Polymer, resist composition containing polymer, and method for manufacturing device using same
  申请人：TOYO GOSEI CO., LTD.

  公开号：US10781276B2

  公开（公告）日：2020-09-22

  An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.

  本发明的目的是提供一种用于抗蚀剂组合物的聚合物，该聚合物对粒子束或电磁波具有较高的吸收效率，并具有优异的灵敏度、分辨率和图案性能特征，同时还提供一种含有该聚合物的抗蚀剂组合物以及使用该聚合物制造设备的方法。 该聚合物包括：单元 A 和单元 B，其中单元 A 具有鎓盐结构，通过粒子束或电磁波的辐照产生第一自由基；单元 B 具有自由基生成结构，其中包含至少一个位于碳原子和碳原子之间或碳原子和杂原子之间的多重键，通过粒子束或电磁波的辐照产生第二自由基，且该多重键不包含在苯环芳香族中。
• POLYMER, RESIST COMPOSITION CONTAINING POLYMER, AND METHOD FOR MANUFACTURING DEVICE USING SAME
  申请人：TOYO GOSEI CO., LTD.

  公开号：US20180273664A1

  公开（公告）日：2018-09-27

  An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.
• US7534547B2
  申请人：——

  公开号：US7534547B2

  公开（公告）日：2009-05-19
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。