2,2-bis(3-amino-4-hydroxy-5-pentafluoroethylphenyl)hexafluoropropane | 265311-59-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,2-bis(3-amino-4-hydroxy-5-pentafluoroethylphenyl)hexafluoropropane
• 英文别名: 2-Amino-4-[2-[3-amino-4-hydroxy-5-(1,1,2,2,2-pentafluoroethyl)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]-6-(1,1,2,2,2-pentafluoroethyl)phenol
• CAS: 265311-59-9
• 化学式: C₁₉H₁₀F₁₆N₂O₂
• 分子量: 602.275
• InChiKey: GCPBXBPTVLXELM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.9
• 重原子数：
  39
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.37
• 拓扑面积：
  92.5
• 氢给体数：
  4
• 氢受体数：
  20

文献信息

• Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
  申请人：LEE Jong-Hwa

  公开号：US20130171563A1

  公开（公告）日：2013-07-04

  Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R 11 , R 12 , R 13 , and R 14 in Chemical Formulae 1 and 2 are the same as defined in the detailed description, a positive photosensitive resin composition including the same, a photosensitive resin film fabricated using the same, and a semiconductor device including the photosensitive resin composition.

  本发明公开了一种光敏性新乐酸树脂，其中包括由以下化学式1表示的结构单元和由以下化学式2表示的结构单元，其中化学式1和2中的R11，R12，R13和R14与详细描述中定义的相同，以及包括该树脂的正向光敏树脂组合物，使用该组合物制造的光敏树脂膜，以及包括该光敏树脂组合物的半导体器件。
• Ortho-Nitrobenzyl Ester Compound and Positive Type Photosensitive Resin Composition Including the Same
  申请人：CHUNG Min-Kook

  公开号：US20120156622A1

  公开（公告）日：2012-06-21

  An ortho-nitrobenzyl ester compound including a compound represented by Chemical Formula 1, and a positive photosensitive resin composition including the same are provided.
• Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same
  申请人：JEONG Ji-Young

  公开号：US20120156614A1

  公开（公告）日：2012-06-21

  Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same.
• Positive Photosensitive Resin Composition, Photosensitive Resin Film and Display Device Using the Same
  申请人：Samsung SDI Co., Ltd.

  公开号：US20150291842A1

  公开（公告）日：2015-10-15

  A positive photosensitive resin composition includes (A) an alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) a photosensitive diazoquinone compound; and (C) a solvent, a photosensitive resin film, and a display device including the same.
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND ELECTRONIC DEVICE USING THE SAME
  申请人：SAMSUNG SDI CO., LTD.

  公开号：US20200103752A1

  公开（公告）日：2020-04-02

  A positive photosensitive resin composition, a photosensitive resin layer, and an electronic device, the composition including an alkali soluble resin; a photosensitive diazoquinone compound; a dissolution controlling agent represented by Chemical Formula 1; a cross-linking agent represented by Chemical Formula 2; and a solvent, wherein the dissolution controlling agent and the cross-linking agent are included in a weight ratio of about 1:1 to about 1:2: