A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), a photoacid generator, and a crosslinker. In formula (1), X is alkyl or alkoxy, R1 and R2 are H, OH, alkyl, substitutable alkoxy or halogen, R3 and R4 are H or CH3, n is an integer of 1 to 4, m and k are an integer of 1 to 5, p, q and r are positive numbers. The composition has a high contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution and good etching resistance.
本发明提供了一种阴性抗蚀剂组合物,该组合物包括由具有式(1)的递归单元组成 的聚合物、光酸发生器和
交联剂。式(1)中,X 是烷基或烷氧基,R1 和 R2 是 H、OH、烷基、可取代的烷氧基或卤素,R3 和 R4 是 H 或
CH3,n 是 1 至 4 的整数,m 和 k 是 1 至 5 的整数,p、q 和 r 是正数。该组合物曝光前后的碱溶解率对比度高,灵敏度高,分辨率高,抗蚀刻性好。