1,3,4,6-Tetrakis(methoxymethyl)-6a-methyl-3a-propylimidazo[4,5-d]imidazole-2,5-dione | 220140-29-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑烷类
• 英文名称: 1,3,4,6-Tetrakis(methoxymethyl)-6a-methyl-3a-propylimidazo[4,5-d]imidazole-2,5-dione
• CAS: 220140-29-4
• 化学式: C₁₆H₃₀N₄O₆
• 分子量: 374.43
• InChiKey: FPLHXUPONQTGOH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  26
• 可旋转键数：
  10
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  84
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20190163063A1

  公开（公告）日：2019-05-30

  A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R 1 is a methyl group or an ethyl group, and R 2 and R 3 are independently a hydrogen atom, a C 1-4 alkyl group, or phenyl group.

  一种用于形成抗蚀底层膜的组合物具有良好的常温储存稳定性。一种用于光刻的抗蚀底层膜的组合物包括具有以下式(1)中的2至6个取代基的含氮化合物，一种聚合物，一种促进交联反应的化合物和一种有机溶剂。其中，具有式(1A)的甘氨酰脲衍生物的每个R1是甲基基团或乙基基团，而R2和R3分别是氢原子、C1-4烷基或苯基。
• Composition for forming resist underlayer film
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US10684546B2

  公开（公告）日：2020-06-16

  A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.

  一种用于形成光刻胶底层膜的组合物在常温下具有优异的储存稳定性。一种用于形成光刻用光刻胶底层膜的组合物，包括在一个分子中具有 2 至 6 个与氮原子成键的下式（1）取代基的含氮化合物、聚合物、促进交联反应的化合物和有机溶剂。例如，在一个分子中具有 2 至 6 个式（1）取代基的含氮化合物是下式（1A）的羟基甲苯衍生物。 式中，每个 R1 是甲基或乙基，R2 和 R3 独立地分别是氢原子、C1-4 烷基或苯基。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
  申请人：FUJIFILM Corporation

  公开号：US10928727B2

  公开（公告）日：2021-02-23

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

  根据本发明，提供了一种光敏或辐射敏感树脂组合物，其中包括在酸的作用下在碱显影剂中的溶解速率会降低的化合物（A）、疏水性树脂（B）和具有芳香环的树脂（C），以及使用该组合物的薄膜、掩膜坯、图案形成方法和电子设备制造方法。
• Antireflective Coating Compositions
  申请人：Yao Huirong

  公开号：US20100009297A1

  公开（公告）日：2010-01-14

  Antireflective coatings and related polymers are disclosed.
• COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20170123319A1

  公开（公告）日：2017-05-04

  Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):