1,3-bis-(2-hydroxy-butyl)-5,5-dimethyl-imidazolidine-2,4-dione | 40388-37-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑烷类
• 英文名称: 1,3-bis-(2-hydroxy-butyl)-5,5-dimethyl-imidazolidine-2,4-dione
• 英文别名: 1,3-di-(2'-hydroxy-n-butyl)-5,5-dimethylhydantoin；1,3-Bis(2-hydroxybutyl)-5,5-dimethylimidazolidine-2,4-dione
• CAS: 40388-37-2
• 化学式: C₁₃H₂₄N₂O₄
• 分子量: 272.345
• InChiKey: RJGJEMOBARLHJZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  19
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.85
• 拓扑面积：
  81.1
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD OF FORMING RESIST PATTERN USING THE SAME
  申请人：Sakamoto Rikimaru

  公开号：US20100221657A1

  公开（公告）日：2010-09-02

  There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.
• RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170045820A1

  公开（公告）日：2017-02-16

  A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R 1 is a C 1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R 2 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C 1-6 alkyl group optionally having a substituent, R 3 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, or halogeno group, R 4 is a direct bond or divalent C 1-8 organic group, R 5 is a divalent C 1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)
• US3932176A
  申请人：——

  公开号：US3932176A

  公开（公告）日：1976-01-13
• US4024146A
  申请人：——

  公开号：US4024146A

  公开（公告）日：1977-05-17
• US4060525A
  申请人：——

  公开号：US4060525A

  公开（公告）日：1977-11-29