α-(5-Tetrazolyl)phenylessigsaeure*H2O | 21418-52-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: α-(5-Tetrazolyl)phenylessigsaeure*H2O
• 英文别名: phenyl-(1(2)H-tetrazol-5-yl)-acetic acid；2-phenyl-2-(2H-tetrazol-5-yl)acetic acid
• CAS: 21418-52-0
• 化学式: C₉H₈N₄O₂
• 分子量: 204.188
• InChiKey: PVSLTJGEFJDZQB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  91.8
• 氢给体数：
  2
• 氢受体数：
  5

文献信息

• Improvements in or relating to leukotriene antagonists
  申请人：ELI LILLY AND COMPANY

  公开号：EP0303478B1

  公开（公告）日：1992-09-30
• Polishing liquid for metals
  申请人：Inaba Tadashi

  公开号：US20070200089A1

  公开（公告）日：2007-08-30

  A liquid for polishing metals, which is used in the chemical and/or mechanical flattening of a semiconductor device, the polishing liquid being characterized in that it comprises at least one member selected from the group consisting of tetrazoles or triazoles represented by any one of the following general formulas (I) to (III): wherein, R a represents at least one substituent selected from the group consisting of a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; R b represents at least one substituent selected from the group consisting of a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; and L b represents a divalent connecting group; and R c and R d each independently represent a hydrogen atom or a substituent, and at least one of R c and R d represent a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group or a group: -L a -R e ; wherein L a represents a divalent connecting group; R e represents a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl or a sulfonamide group; R and R′ each independently represent a group selected from the group consisting of a hydrogen atom, alkyl groups and aryl groups; and R″ independently represents a group selected from the group consisting of alkyl groups and aryl groups.
• METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH
  申请人：TOMIGA Takamitsu

  公开号：US20080206995A1

  公开（公告）日：2008-08-28

  The present invention provides a metal-polishing liquid that is used in chemical mechanical polishing for a conductor film made of copper or a copper alloy during semiconductor device production, wherein the metal-polishing liquid comprises the following components (1), (2) and (3): (1) an amino-acid derivative represented by the following formula (I) wherein in the formula (I), R 1 represents an alkyl group having 1 to 4 carbon atoms; (2) colloidal silica in which silicon atoms on a surface thereof are at least partially modified by aluminum atoms; and (3) an oxidant.
• METAL-POLISHING LIQUID AND POLISHING METHOD
  申请人：YAMADA Toru

  公开号：US20080242090A1

  公开（公告）日：2008-10-02

  A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), R 1 represents an alkyl group having 1 to 4 carbon atoms and R 2 represents an alkylene group having 1 to 4 carbon atoms.
• POLISHING LIQUID FOR METALS
  申请人：INABA Tadashi

  公开号：US20100330809A1

  公开（公告）日：2010-12-30

  A liquid for polishing metals, which is used in the chemical and/or mechanical flattening of a semiconductor device, the polishing liquid being characterized in that it comprises at least one member selected from the group consisting of tetrazoles or triazoles represented by any one of the following general formulas (I) to (III): wherein, R a represents at least one substituent selected from the group consisting of a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; R b represents at least one substituent selected from the group consisting of a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; and L b represents a divalent connecting group; and R c and R d each independently represent a hydrogen atom or a substituent, and at least one of R c and R d represent a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group or a group: -L a -R e ; wherein L a represents a divalent connecting group; R e represents a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl or a sulfonamide group; R and R′ each independently represent a group selected from the group consisting of a hydrogen atom, alkyl groups and aryl groups; and R″ independently represents a group selected from the group consisting of alkyl groups and aryl groups.