申请人:AT&T Bell Laboratories
公开号:US05200544A1
公开(公告)日:1993-04-06
A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.
此类抗蚀剂组合物对深紫外光敏感,包括对酸敏感的树脂和一种在暴露于此类辐射时产生酸的组合物。特别是,硝基苄基材料适合用作酸发生剂。