A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.
功能薄膜包括含有
树脂的层 (A) 和含有
全氟聚醚基团化合物的层 (B)。层(B)在远离层(A)的表面上具有微凹凸图案结构。用 X 射线光电子能谱从层(B)一侧进行元素分析,功能薄膜符合式(1):D1<2×X1,其中 X1 是层(B)的厚度(纳米);D1 是
氟原子浓度为 1 原子%或更低的深度(纳米)。在通过 X 射线光电子能谱从层(B)侧测量碳 1s 光谱时,功能薄膜满足式(2):D2<2×X1,其中 X1 是层(B)的厚度(纳米);D2 是在 290 至 300 eV 的键能范围内检测不到峰值的深度(纳米)。