<(5-hydroxy-1-naphthylenyl)oxy>acetic acid | 95265-30-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: <(5-hydroxy-1-naphthylenyl)oxy>acetic acid
• 英文别名: 2-(5-Hydroxynaphthalen-1-yl)oxyacetic acid
• CAS: 95265-30-8
• 化学式: C₁₂H₁₀O₄
• 分子量: 218.209
• InChiKey: SLVGKFLABWABEQ-UHFFFAOYSA-N

物化性质

• 沸点：
  458.4±20.0 °C(Predicted)
• 密度：
  1.388±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  1,5-二羟基萘 在 sodium hydroxide 、 potassium carbonate 作用下， 以 四氢呋喃 、 丙酮 为溶剂， 生成 <(5-hydroxy-1-naphthylenyl)oxy>acetic acid
  参考文献：
  名称：

  Development of a Selective Enzyme-Linked Immunosorbent Assay for 1-Naphthol-the Major Metabolite of Carbaryl (1-Naphthyl N-Methylcarbamate)

  摘要：

  selective enzyme-linked immunosorbent assay for 1-naphthol was developed. Eight rabbits were immunized with either [(5-hydroxy-2-naphthylenyl)oxy]acetic acid (2b)-BSA, [(5-hydroxy-1-naphthylenyl)oxy]acetic acid (4)-BSA, or 5-hydroxy-2-naphthoic acid (7)-KLH, and all sera were screened against 14 different coating antigens. From this screening procedure, five assays could be developed, using two 7-KLH antisera, 3907 and 3909. The assay with the least interference and the best reliability (7-KLH antiserum 3907, 1:9000, and coating antigen 2b-BSA, 1.5 mu g/mL) was further optimized and characterized. It showed an I-50 value of about 72 mu g/L, with a range of detection from 10 to 1000 mu g/L. There was no cross-reactivity with carbaryl, which makes this assay very suitable for the selective detection of 1-naphthol, for example, in undiluted human urine and in soil extract. The assay was tested in organic solvents and showed a tolerance of at least 10% solvent (acetone, acetonitrile, methanol).

  DOI：

  10.1021/jf00040a019

文献信息

• Conductive material and substrate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10023752B2

  公开（公告）日：2018-07-17

  The present invention provides a conductive material including: (A) a π-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively shown by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more salts selected from the group consisting of a monovalent copper salt of carboxylic acid, a monovalent copper salt of β-diketone, and a monovalent copper salt of β-ketoester. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.

  本发明提供了一种导电材料，包括(A) π-共轭聚合物；(B) 掺杂聚合物，其含有一个或多个如下通式(1)所示分别选自 "a1 "至 "a4 "的重复单元，且其重量平均分子量在 1,000 至 500,000 之间；以及 (C) 一种或多种盐，其选自由羧酸的一价铜盐、β-二酮的一价铜盐和β-酮酯的一价铜盐组成的组。本发明可提供一种导电材料，该材料具有优异的成膜性，并可形成具有高透明度和导电性的导电薄膜，在由该材料形成薄膜时，还具有优异的柔韧性和平整度。
• Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
  申请人：FUJIFILM Corporation

  公开号：US10423068B2

  公开（公告）日：2019-09-24

  Provided are an active-light-sensitive or radiation-sensitive resin composition in which the sensitivity is excellent, and an active-light-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the active-light-sensitive or radiation-sensitive resin composition. The active-light-sensitive or radiation-sensitive resin composition contains a resin (Ab) whose polarity is changed by the action of an acid, and a compound that generates an acid upon irradiation with active light or radiation, in which the resin (Ab) includes a metal ion, and the metal type of the metal ion is at least one of metal types belonging to Groups 1 to 10 and 13 to 16 (here, excluding Mg and Cs).

  本发明提供了一种灵敏度极佳的主动感光或辐射敏感树脂组合物，以及使用该主动感光或辐射敏感树脂组合物的主动感光或辐射敏感胶片、图案形成方法和电子设备制造方法。主动感光或辐射敏感树脂组合物包含一种在酸作用下极性改变的树脂（Ab）和一种在主动光或辐射照射下产生酸的化合物，其中树脂（Ab）包括金属离子，金属离子的金属类型至少是属于第 1 至 10 组和第 13 至 16 组（此处不包括 Mg 和 Cs）的金属类型之一。
• Anti SRS-A carboxylic acid derivatives, processes for their production and pharmaceutical formulations containing them
  申请人：FISONS plc

  公开号：EP0061800B1

  公开（公告）日：1985-08-28
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120202153A1

  公开（公告）日：2012-08-09

  A resist composition comprising a polymer having recurring units having an acid labile group and recurring units of a magnesium, copper, zinc or cesium salt of (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid copolymerized together exhibits a high resolution, high sensitivity, and minimal LER. The resist composition is best suited as the patterning material for VLSIs and photomasks.
• CONDUCTIVE MATERIAL AND SUBSTRATE
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170130070A1

  公开（公告）日：2017-05-11

  The present invention provides a conductive material including: (A) a π-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively shown by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more salts selected from the group consisting of a monovalent copper salt of carboxylic acid, a monovalent copper salt of β-diketone, and a monovalent copper salt of β-ketoester. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.