3,4-Diphenyl-thiophen-2-thiol | 92965-57-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 3,4-Diphenyl-thiophen-2-thiol
• 英文别名: 3,4-Diphenylthiophene-2-thiol
• CAS: 92965-57-6
• 化学式: C₁₆H₁₂S₂
• 分子量: 268.403
• InChiKey: OVFWUWMABRIJED-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  29.2
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
  申请人：OHASHI Masaki

  公开号：US20100209827A1

  公开（公告）日：2010-08-19

  There is disclosed a sulfonate shown by the following general formula (2). R 1 —COOC(CF 3 ) 2 —CH 2 SO 3 − M + (2) (In the formula, R 1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M + represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.

  本发明揭示了一种磺酸盐，其通式如下（2）所示。 R1-COOC（CF3）2-CH2SO3-M+（2）（其中，R1表示具有1至50个碳原子的线性、分支或环状单价碳氢基团，可选含有杂原子。M+表示一个阳离子）。本发明可以提供：一种新型磺酸盐，其在抗蚀剂溶剂和树脂中具有足够高的溶解度（相容性），良好的储存稳定性，PED稳定性，进一步扩大焦点深度，良好的灵敏度，特别是高分辨率和良好的图案轮廓形态；一种光敏酸发生剂；使用该组合物的抗蚀剂组合物；一种光掩膜空白，以及一种制图工艺。
• NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20110189607A1

  公开（公告）日：2011-08-04

  There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R 1 represents a divalent hydrocarbon group having 1 to 36 carbon atoms optionally containing a hetero atom; and R 2 and R 3 each represents a monovalent hydrocarbon group having 1 to 30 carbon atoms optionally containing a hetero atom or R 2 and R 3 may be bonded with each other to form a ring together with a sulfur atom in the formula. There can be provided a sulfonium salt usable as a resist composition providing high resolution and excellent in LER in photolithography using a high energy beam such as an ArF excimer laser, an EUV light and an electron beam as a light source, a polymer obtained from the sulfonium salt, a resist composition containing the polymer and a patterning process using the resist composition.

  本发明公开了一种由下列通式（1）表示的烷基磺鎵盐。在该式中，X和Y分别表示具有可聚合官能团的基团；Z表示具有1至33个碳原子的双价碳氢基团，可选地含有一个杂原子；R1表示具有1至36个碳原子的双价碳氢基团，可选地含有一个杂原子；R2和R3分别表示具有1至30个碳原子的单价碳氢基团，可选地含有一个杂原子，或者R2和R3可以与该式中的硫原子一起形成环。可以提供一种可用作抗蚀剂组分的烷基磺鎵盐，该抗蚀剂组分在使用高能束如ArF准分子激光、EUV光和电子束作为光源的光刻工艺中，提供高分辨率和优异的LER，以及从该烷基磺鎵盐得到的聚合物、包含该聚合物的抗蚀剂组分和使用该抗蚀剂组分进行图案化处理的方法。
• Olefin-based resin composition, manufacturing method therefor, and molded article thereof
  申请人：ADEKA CORPORATION

  公开号：US11339231B2

  公开（公告）日：2022-05-24

  Provided are: an olefin-based resin composition that can yield a molded article having excellent transparency in which coloration is inhibited; a method for producing the olefin-based resin composition; and a molded article of the olefin-based resin composition. The olefin-based resin composition contains, with respect to 100 parts by mass of an olefin polymer: 0.001 to 10 parts by mass of one or more compounds (A) represented by Formula (1) wherein R1 to R4 each independently represent a hydrogen atom or an alkyl group having 1 to 9 carbon atoms; R5 represents a hydrogen atom or methyl; m represents 1 or 2; and M1 represents, for example, a hydrogen atom; and 0.001 to 10 parts by mass of a fatty acid metal salt (B) represented by Formula (2) wherein R6 represents a group having 10 to 30 carbon atoms and introduced from an aliphatic organic acid; n represents 1 or 2; and M2 represents an alkali metal atom or a multivalent metal inorganic group. In the olefin-based resin composition, an aluminum content in the olefin polymer is 0.01 mol or less per 1 kg of the olefin polymer.

  本发明提供了：一种烯烃基树脂组合物，该组合物可以生产出具有优异透明性的模塑制品，并且可以抑制着色；一种生产该烯烃基树脂组合物的方法；以及一种使用该烯烃基树脂组合物的模塑制品。烯烃基树脂组合物含有以 100 质量份计的烯烃聚合物：0.001 至 10 质量份的由式 (1) 表示的一种或多种化合物 (A) 其中 R1 至 R4 各自独立地代表氢原子或具有 1 至 9 个碳原子的烷基；R5 代表氢原子或甲基；m 代表 1 或 2；以及 M1 代表例如氢原子；以及 0.001至10质量份由式(2)代表的脂肪酸金属盐(B)，其中R6代表具有10至30个碳原子并由脂肪族有机酸引入的基团；n代表1或2；M2代表碱金属原子或多价金属无机基团。在烯烃基树脂组合物中，每 1 千克烯烃聚合物中的铝含量为 0.01 摩尔或更少。
• Thiophene-containing photo acid generators for photolithography
  申请人：INTERNATIONAL BUSINESS MACHINES CORPORATION

  公开号：US20030008230A1

  公开（公告）日：2003-01-09

  Thiophene-containing photo acid generators having either of the following general formulas: 1 wherein at least one of R 1 , R 2 or R 3 is thiophene or thiophene that is substituted with alkyl, alkoxy or cycloalkyl, and the remaining R 1 , R 2 or R 3 , not containing a thiophene moiety, are independently selected from the group consisting of alkyl, cycloalkyl and aryl, or at least one of R 1 , R 2 or R 3 are joined together to form a cyclic moiety having from about 4 to about 8 ring carbon atoms; and Y is a counter ion, are disclosed as well as the use thereof as a component of a chemically amplified resist composition. In addition to the thiophene-containing photo acid generator, the inventive composition includes a chemically amplified base polymer, a solvent, an optional photosensitizer, an optional base, an optional dissolution modifying agent and an optional surfactant.

  具有以下任一通式的含噻吩的光酸发生器： 1 其中 R 1 , R 2 或 R 3 是噻吩或被烷基、烷氧基或环烷基取代的噻吩，其余 R 1 , R 2 或 R 3 不含噻吩分子，且独立地选自烷基、环烷基和芳基组成的组，或至少一个 R 1 , R 2 或 R 3 本发明公开了含噻吩的光酸发生器，以及其作为化学放大抗蚀剂组合物成分的用途。除了含噻吩的光酸发生器外，本发明组合物还包括化学放大基聚合物、溶剂、任选光敏剂、任选碱、任选溶解改性剂和任选表面活性剂。
• OLEFIN-BASED RESIN COMPOSITION, MANUFACTURING METHOD THEREFOR, AND MOLDED ARTICLE THEREOF
  申请人：ADEKA CORPORATION

  公开号：US20200317830A1

  公开（公告）日：2020-10-08

  Provided are: an olefin-based resin composition that can yield a molded article having excellent transparency in which coloration is inhibited; a method for producing the olefin-based resin composition; and a molded article of the olefin-based resin composition. The olefin-based resin composition contains, with respect to 100 parts by mass of an olefin polymer: 0.001 to 10 parts by mass of one or more compounds (A) represented by Formula (1) wherein R 1 to R 4 each independently represent a hydrogen atom or an alkyl group having 1 to 9 carbon atoms; R 5 represents a hydrogen atom or methyl; m represents 1 or 2; and M 1 represents, for example, a hydrogen atom; and 0.001 to 10 parts by mass of a fatty acid metal salt (B) represented by Formula (2) wherein R 6 represents a group having 10 to 30 carbon atoms and introduced from an aliphatic organic acid; n represents 1 or 2; and M 2 represents an alkali metal atom or a multivalent metal inorganic group. In the olefin-based resin composition, an aluminum content in the olefin polymer is 0.01 mol or less per 1 kg of the olefin polymer.