1.3-Cyclohexadien-1-yl-phenylsulfid | 64691-42-5

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: 1.3-Cyclohexadien-1-yl-phenylsulfid
• 英文别名: Cyclohexa-1,3-dien-1-ylsulfanylbenzene
• CAS: 64691-42-5
• 化学式: C₁₂H₁₂S
• 分子量: 188.293
• InChiKey: NNXJIDUZJUPQOB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  25.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  苯次磺酰氯 在 1,8-二氮杂双环[5.4.0]十一碳-7-烯 作用下， 生成 1.3-Cyclohexadien-1-yl-phenylsulfid
  参考文献：
  名称：

  Chlorosulfenylation-dehydrochlorination reactions. New and improved methodology for the synthesis of unsaturated aryl sulfides and aryl sulfones

  摘要：

  DOI：

  10.1021/jo00400a041

文献信息

• Lithographic printing plate precursor, lithographic printing method and cyanine dye
  申请人：FUJIFILM Corporation

  公开号：EP1767353A2

  公开（公告）日：2007-03-28

  A lithographic printing plate precursor comprising a support and an image-recording layer containing at least one infrared absorbing agent of a cyanine dye in which a HOMO energy level of each of substituents present on both terminal nitrogen atoms is -10.0 eV or higher. An infrared absorbing agent of a cyanide dye represented by formula (V) shown below: wherein Z1 and Z2 each independently represents an aromatic ring which may have a substituent or a hetero aromatic ring which may have a substituent; R10 and R20 each independently represents a phenyl group, a naphtyl group, an anthracenyl group, a carbazolyl group or a phenothiazinyl group each of which may have a substituent; A- represents an anion which exists in case of being necessary for neutralizing a charge and is selected from a halogen ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion and a sulfonate ion; and n represents 1 or 2.

  一种平版印刷板前驱体，包括一个支撑体和一个图像记录层，该支撑体和图像记录层含有至少一种氰基染料的红外吸收剂，其中存在于两个末端氮原子上的每个取代基的 HOMO 能级为 -10.0 eV 或更高。 由下式(V)表示的氰化物染料的红外吸收剂： 其中 Z1 和 Z2 各自独立地代表可具有取代基的芳环或可具有取代基的杂芳环；R10 和 R20 各自独立地代表可具有取代基的苯基、萘基、蒽基、咔唑基或吩噻嗪基；A- 代表中和电荷所需的阴离子，选自卤素离子、高氯酸盐离子、四氟硼酸盐离子、六氟磷酸根离子和磺酸盐离子；n 代表 1 或 2。
• AROMATIC POLYTHIOL COMPOUND FOR OPTICAL MATERIAL
  申请人：SKC Co., Ltd.

  公开号：EP3486272A1

  公开（公告）日：2019-05-22

  An embodiment relates to an aromatic polythiol compound for optical materials, and the aromatic polythiol compound according to the embodiment contains a phenyl group and a large number of sulfur atoms in its polythiol structure so that a polymerizable composition and an optical material obtained therefrom have excellent optical properties such as high refractive index and low specific gravity, as well as excellent mechanical properties such as low cure shrinkage; thus, they can be advantageously used for producing various plastic optical lenses such as eyeglass lenses and camera lenses.

  一个实施例涉及一种用于光学材料的芳香族聚硫醇化合物，根据该实施例的芳香族聚硫醇化合物在其聚硫醇结构中含有一个苯基和大量的硫原子，从而使可聚合组合物和由此获得的光学材料具有优异的光学性能，如高折射率和低比重，以及优异的机械性能，如低固化收缩率；因此，它们可有利地用于生产各种塑料光学镜片，如眼镜片和相机镜片。
• COMPOSITION, CURED PRODUCT AND LAMINATE
  申请人：DIC Corporation

  公开号：EP3560968A1

  公开（公告）日：2019-10-30

  An object of the invention is to provide a composition having excellent heat resistance and excellent adhesiveness. Moreover, another object is to provide a cured product obtained by curing the composition and a laminate containing the cured product. Furthermore, another object is to provide a heat-resistant material, a heat-resistant member, an electronic material and an electronic member each containing the composition. The objects are achieved by providing a composition including: a (meth)allyl group-containing maleimide compound having a structure having one or more benzene rings, one or more groups having a (meth)allyl group and one or more groups having a maleimide group; and a hydroxy group-containing maleimide compound having a structure having one or more benzene rings, one or more groups having a hydroxy group and one or more maleimide groups.

  本发明的一个目的是提供一种具有优异耐热性和粘合性的组合物。此外，本发明的另一个目的是提供一种通过固化该组合物而获得的固化产品，以及一种含有该固化产品的层压材料。此外，另一个目的是提供含有该组合物的耐热材料、耐热部件、电子材料和电子部件。上述目的是通过提供一种组合物来实现的，该组合物包括：一种含（甲基）烯丙基的马来酰亚胺化合物，其结构具有一个或多个苯环、一个或多个具有（甲基）烯丙基的基团和一个或多个具有马来酰亚胺基团的基团；以及一种含羟基的马来酰亚胺化合物，其结构具有一个或多个苯环、一个或多个具有羟基的基团和一个或多个马来酰亚胺基团。
• [EN] PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSÉ UTILISÉ DANS CE PROCÉDÉ, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE, ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014119698A1

  公开（公告）日：2014-08-07

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.