4-[(tribromomethyl)sulfonyl]Phenol | 1224635-68-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-[(tribromomethyl)sulfonyl]Phenol
• 英文别名: 4-(tribromomethylsulfonyl)phenol
• CAS: 1224635-68-0
• 化学式: C₇H₅Br₃O₃S
• 分子量: 408.89
• InChiKey: BSOHJLASTSTRDH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
  申请人：Furukawa Akira

  公开号：US20110318689A1

  公开（公告）日：2011-12-29

  An object of the present invention is to provide a light-sensitive lithographic printing plate material having high sensitivity, generating no background stain even when development is carried out by using a neutral developing solution having a pH of less than 9, or an alkali developing solution having a pH in the range of 9 to 12, generating no background stain even when the plate is allowed to stand after developing treatment or during printing for a long period of time, and having excellent in printing endurance and ink transfer property, and it is accomplished by a light-sensitive lithographic printing plate material which comprises a support and a photo-curable light-sensitive layer formed thereon, said photo-curable light-sensitive layer contains a polymer synthesized by using at least a compound represented by the following mentioned general formula I: wherein R 1 , R 2 and R 3 each independently represent an alkyl group or an alkoxy group each having 1 to 10 carbon atoms; provided that at least two of R 1 , R 2 and R 3 represent alkoxy groups; and Y 1 represents an alkylene group having 1 to 10 carbon atoms, and having a polymerizable double bond group and at least one of a carboxyl group and a sulfonate group at a side chain.
• PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
  申请人：Furukawa Akira

  公开号：US20130022927A1

  公开（公告）日：2013-01-24

  Disclosed are a photosensitive composition containing an aqueous dispersion and having excellent storage stability, and a photosensitive lithographic printing plate material using the photosensitive composition and being capable of being developed using water, which is advantageous not only in that the photosensitive lithographic printing plate material exhibits high sensitivity and high image quality as well as excellent storage stability, but also in that even when the printing plate material is repeatedly subjected to developing treatment using water, the generation of sludge derived from the photosensitive composition in the developer repeatedly used is suppressed, achieving excellent developing properties. A photosensitive composition containing at least an aqueous dispersion comprising an oil-in-water emulsion of a photopolymerization initiator and an oil-in-water emulsion of a compound having a polymerizable double bond group, at least one of the oil-in-water emulsion of the photopolymerization initiator and the oil-in-water emulsion of the compound having a polymerizable double bond group being an oil-in-water emulsion obtained by emulsifying and dispersing the photopolymerization initiator or the compound having a polymerizable double bond group in water in the presence of a water-soluble polymer having a sulfonate group and an anionic surfactant.
• LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
  申请人：FUJIFILM Corporation

  公开号：US20220161542A1

  公开（公告）日：2022-05-26

  Provided is a lithographic printing plate precursor having an aluminum support and an image-recording layer formed on the aluminum support, in which the image-recording layer contains resin particles A that have an ethylenically unsaturated group and a compound B that has an ethylenically unsaturated group other than the resin particles A and has an ethylenically unsaturated bond valence of 1.5 mmol/g or more. Also provided are a method for preparing lithographic printing plate or a lithographic printing method using the lithographic printing plate precursor.
• US8647813B2
  申请人：——

  公开号：US8647813B2

  公开（公告）日：2014-02-11