trimethyl-phenethyl-ammonium; hydroxide | 62510-53-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: trimethyl-phenethyl-ammonium; hydroxide
• 英文别名: Trimethyl-phenaethyl-ammonium; Hydroxid；Trimethyl(2-phenylethyl)azanium;hydroxide
• CAS: 62510-53-6
• 化学式: C₁₁H₁₈N*HO
• 分子量: 181.278
• InChiKey: SEICVHBZTAWPFM-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  1.76
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION
  申请人：Lee Wai Mun

  公开号：US20090111965A1

  公开（公告）日：2009-04-30

  The present application relates to semiconductor processing compositions comprising at least one compound containing at least one amidoxime functional group and to methods of using these compositions in semiconductor processing. The present application also describes the preparation of amidoximes for a semiconductor processing composition by (a) mixing a cyanoethylation catalyst, a nucleophile and an alpha-unsaturated nitrile to produce a cyanoethylation product; and (b) converting a cyano group in the cyanoethylation product into an amidoxime functional group.

  本申请涉及包含至少一个含有至少一个酰胺肟功能团的化合物的半导体加工组合物，以及使用这些组合物进行半导体加工的方法。本申请还描述了通过(a)混合氰乙基化催化剂、亲核试剂和不饱和α腈以产生氰乙基化产品；(b)将氰乙基化产品中的氰基团转化为酰胺肟功能团来制备用于半导体加工组合物的酰胺肟的方法。
• Method For Producing Pyrimidinylpyrazole Compounds
  申请人：Fukunishi Hirotada

  公开号：US20120283441A1

  公开（公告）日：2012-11-08

  The present invention provides a method for producing a pyrimidinylpyrazole compound (1), wherein aminoguanidine (2) or its salt is reacted with a β-diketone compound (3) to produce the pyrimidinylpyrazole compound: wherein R 1 and R 3 are each independently an alkyl group having 1 to 4 carbon atoms, and R 2 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. The method is excellent in the environmental compatibility and economic efficiency.

  本发明提供了一种生产嘧啶基吡唑化合物（1）的方法，其中氨基胍（2）或其盐与β-二酮化合物（3）反应，以产生嘧啶基吡唑化合物：其中R1和R3分别独立地是具有1至4个碳原子的烷基基团，而R2是氢原子或具有1至4个碳原子的烷基基团。该方法在环境兼容性和经济效益方面表现出色。
• CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE
  申请人：Lee Wai Mun

  公开号：US20090130849A1

  公开（公告）日：2009-05-21

  A composition and associated method for chemical mechanical planarization (or other polishing) is described. The composition contains an amidoxime compound and water. The composition may also contain an abrasive and a compound with oxidation and reduction potential. The composition is useful for attaining improved removal rates for metal, including copper, barrier material, and dielectric layer materials in metal CMP. The composition is particularly useful in conjunction with the associated method for metal CMP applications.

  本文描述了一种化学机械平整化（或其他抛光）的组合物及其相关方法。该组合物含有一种酰胺肟化合物和水。该组合物还可以含有磨料和具有氧化还原潜力的化合物。该组合物可用于在金属CMP中获得改进的金属去除速率，包括铜、屏障材料和金属CMP中的介电层材料。该组合物在金属CMP应用的相关方法中特别有用。
• METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS
  申请人：Lee Wai Mun

  公开号：US20100043823A1

  公开（公告）日：2010-02-25

  The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.

  本发明涉及含有酰胺肟化合物的水性组合物及其清洗半导体衬底上等离子体刻蚀残留物的方法，包括这种稀释的水性溶液。本发明的组合物可以选择性地含有一种或多种其他酸性化合物、一种或多种碱性化合物、含氟化合物和其他成分，如有机溶剂、螯合剂、胺和表面活性剂。本发明还涉及一种在集成电路制造过程中从衬底上去除残留物的方法。
• COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS
  申请人：Lee Wai Mun

  公开号：US20100105595A1

  公开（公告）日：2010-04-29

  The present invention is a novel aqueous cleaning solution for use in semiconductor front end of the line (FEOL) manufacturing process wherein the cleaning solution comprises at least one amidoxime compound.

  本发明是一种用于半导体前端制造过程中的新型水性清洗溶液，其中清洗溶液包含至少一种酰胺肟化合物。