SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD
申请人:TOYO GOSEL CO., LTD.
公开号:US20180011401A1
公开(公告)日:2018-01-11
A sulfonic acid derivative, wherein the sulfonic acid derivative is represented by the following general formula (1):
R
1
COOCH
2
CH
2
CFHCF
2
SO
3
−
M
+
(1)
where: R
1
represents a monovalent organic group having carbon number of 1 to 200, having at least one hydroxyl group and optionally having a substituent other than the hydroxyl group; and M
+
represents a counter cation.