bis(4-t-butylphenyl)iodonium perfluorobenzenesulfonate | 220122-68-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis(4-t-butylphenyl)iodonium perfluorobenzenesulfonate
• 英文别名: Bis(4-tert-butylphenyl)iodanium;2,3,4,5,6-pentafluorobenzenesulfonate
• CAS: 220122-68-9
• 化学式: C₆F₅O₃S*C₂₀H₂₆I
• 分子量: 640.453
• InChiKey: GECMLZVDSCAIKA-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  36
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.31
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  8

文献信息

• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
  申请人：——

  公开号：US20030113658A1

  公开（公告）日：2003-06-19

  A novel photoacid generator containing a structure of the following formula (I), 1 wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z 1 and Z 2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

  提供一种新型光酸发生剂，其含有以下式(I)的结构，其中R是一种具有50重量％或以下氟含量，硝基，氰基或氢原子的一价有机基团，Z1和Z2分别是氟原子或具有1-10个碳原子的线性或支链全氟烷基团。当用于化学增感辐射敏感树脂组成物中时，该光酸发生剂表现出高透明度，相对高的可燃性和无生物积累，并产生具有高酸度，高沸点，适度短的扩散长度在抗蚀涂层中，并且对掩模图案密度的依赖性低的酸。
• Radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：EP1253470A2

  公开（公告）日：2002-10-30

  A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), (R1, R2, and R3 is hydrogen, hydroxyl group, or monovalent organic group and R4 is monovalent acid-dissociable group), (B) an alkali insoluble or scarcely soluble resin comprising a recurring unit of the following formula (2), (R5 is hydrogen or monovalent organic group, R' hydrogen or methyl, n 1-3, m 0-3) and a recurring unit containing acid-dissociable group, and (C) a photoacid generator. The resin composition is useful as a chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure.

  一种辐射敏感树脂组合物，包括(A)下式(1)的化合物、 (R1、R2 和 R3 为氢、羟基或一价有机基团，R4 为一价酸解离基团），（B）碱不溶性或难溶性树脂，包括下式（2）的循环单元、 (R5 为氢或一价有机基团，R' 为氢或甲基，n 1-3，m 0-3)和含有酸可分解基团的循环单元，以及 (C) 光酸发生器。该树脂组合物可用作化学放大抗蚀剂，具有高灵敏度、高分辨率、高辐射透过率和表面平滑度，并且不会在过度曝光时出现部分不溶解的问题。
• VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1231205A1

  公开（公告）日：2002-08-14

  Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.

  乙烯基苯丙酸衍生物；生产该衍生物的工艺；该衍生物的聚合物；以及含有该聚合物的辐射敏感树脂组合物。上述聚合物的辐射吸收率低，可用作辐射敏感树脂组合物的树脂成分，尤其适用于化学放大抗蚀剂。例如，4-乙烯基苯基丙酸叔丁酯是通过以下方法制得的：(1) 将溴乙酸叔丁酯与三(正丁基)膦反应，得到季鏻盐、(2) 将这种盐与碱反应，得到一种磷酰亚胺； (3) 将这种酰亚胺与 2,4,6-三（3',5'-二-叔丁基-4'-羟基苄基）甲基苯乙烯反应，得到一种季鏻盐； (4) 将这种盐水解。