Gault, Bulletin de la Societe Chimique de France, 1908, vol. <4>3, p. 374
作者:Gault
DOI:——
日期:——
Using functionalized nonlinear optical chromophores to prepare NLO-active polycarbonate films
作者:M. González-Lainez、M.T. Jiménez-Ruiz、N. Martínez de Baroja、J. Garín、J. Orduna、B. Villacampa、M.J. Blesa
DOI:10.1016/j.dyepig.2015.02.026
日期:2015.8
Novel functionalized second order nonlinear optical (NLO) chromophores have been prepared with functionalized aniline as electron donor, thiophene or isophorone as a pi-spacer and 1,3-diethyl-2-thiobarbituric acid as electron acceptor. The films prepared from dyes with alkylsilyl bulky groups gave better performance than the corresponding non functionalized chromophores due to the reduction of the intermolecular electrostatic interactions. The incorporation of chromophores 4 and 10 in a polycarbonate matrix allowed the preparation of good optical-quality films. Nonlinear coefficients d(33) and d(31) as high as 17 and 5.6 pm V-1, respectively, were obtained. Moreover, the temporal stability of these hostguest films was confirmed up to eight months (>80%). (C) 2015 Elsevier Ltd. All rights reserved.
Schorigin; Below, Chemische Berichte, 1935, vol. 68, p. 833,837
作者:Schorigin、Below
DOI:——
日期:——
PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20130157194A1
公开(公告)日:2013-06-20
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring under the action of an acid so that the polymer may reduce its solubility in an organic solvent developer, an acid generator, and an organic solvent displays a high dissolution contrast between the unexposed region of promoted dissolution and the exposed region of inhibited dissolution.