4-sek-Butyl-N-cyclohexyl-benzolsulfonamid-(1) | 94461-19-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-sek-Butyl-N-cyclohexyl-benzolsulfonamid-(1)
• 英文别名: 4-butan-2-yl-N-cyclohexylbenzenesulfonamide
• CAS: 94461-19-5
• 化学式: C₁₆H₂₅NO₂S
• 分子量: 295.446
• InChiKey: FCTGPMNYMMFMAC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  54.6
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
  申请人：Yamaguchi Shuhei

  公开号：US20130115557A1

  公开（公告）日：2013-05-09

  Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.
• US9034558B2
  申请人：——

  公开号：US9034558B2

  公开（公告）日：2015-05-19