The invention relates to electroplating additives for the deposition of a group (11) (lB) metal/binary or ternary group (11) (IB)-group (13) (lIlA)/ternary, quaternary or pentanary group (11) (lB)-group (13) (lIlA)-group (16) (VIA) alloy on substrates useful for thin film solar cells. The additives have the general formula (A):
wherein X1 and X2 may be the same or different and are selected from the group consisting of arylene and heteroarylene; FG1 and FG2 may be the same or different or are selected from the group consisting of -S(O)2OH, -S(O)OH, -COOH, -P(O)2OH and primary, secondary and tertiary amino groups and salts and esters thereof; R is selected from the group consisting of alkylene, arylene or heteroarylene and n and m are integers from 1 to 5.
本发明涉及用于在薄膜太阳能电池基板上沉积(11)(lB)族
金属/二元或三元(11)(IB)-(13)(lIlA)族/三元、四元或五元(11)(lB)-(13)(lIlA)-(16)(VIA)族合
金的电镀添加剂。添加剂的通式为 (A):
其中 X1 和 X2 可以相同或不同,并且选自由芳基和杂芳基组成的组;FG1 和 FG2 可以相同或不同,或者选自由-S(O)2OH、-S(O)OH、-COOH、-P(O)2OH 和伯、仲、叔
氨基及其盐和酯组成的组;R 选自由亚烷基、芳基或杂芳基组成的组,n 和 m 是 1 至 5 的整数。