tetraiodo-phthalic acid monoethyl ester | 120614-27-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: tetraiodo-phthalic acid monoethyl ester
• 英文别名: Tetrajod-phthalsaeure-monoaethylester；1-Ethyl 3,4,5,6-tetraiodo-1,2-benzenedicarboxylate；2-ethoxycarbonyl-3,4,5,6-tetraiodobenzoic acid
• CAS: 120614-27-9
• 化学式: C₁₀H₆I₄O₄
• 分子量: 697.773
• InChiKey: MAZLXPIFLAKSLH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  63.6
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  乙醇 、 四碘邻苯二甲酸酐 生成 tetraiodo-phthalic acid monoethyl ester
  参考文献：
  名称：

  Dummel et al., Journal of the American Pharmaceutical Association (1912), 1959, vol. 48, p. 181

  摘要：

  DOI：

文献信息

• Resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10295904B2

  公开（公告）日：2019-05-21

  A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

  抗蚀剂组合物由基质聚合物和碘化苯甲酸锍盐组成，具有高灵敏度和最小 LWR，与正负色调无关。
• Monier,J. A., Diss. <Massachusetts Inst. of Technol. 1932> S. 84
  作者：Monier,J. A.

  DOI：——

  日期：——
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170351177A1

  公开（公告）日：2017-12-07

  A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200241418A1

  公开（公告）日：2020-07-30

  A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.