一氟化氮 | 13967-06-1

• 分子结构分类: 有机化合物
• 中文名称: 一氟化氮
• 英文名称: nitrogen monofluoride
• 英文别名: nitrogen fluoride；fluoroimidogen
• CAS: 13967-06-1
• 化学式: FN
• 分子量: 33.0051
• InChiKey: CMUBZTZNXGBJMQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  2
• 可旋转键数：
  0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  一氟化氮 、 氢气 以 gaseous matrix 为溶剂， 生成 氨
  参考文献：
  名称：

  一氟化氮（a1DEL）与原子氮（2D）反应生成的氮（B3.PI.g，v'= 1-12）

  摘要：

  DOI：

  10.1021/j100374a032
• 作为产物：
  描述：

  二氟氨基自由基 以 gas 为溶剂， 生成 一氟化氮
  参考文献：
  名称：

  Tunable UV laser photolysis of NF₂: Quantum yield for NF(a ¹Δ) production

  摘要：

  The UV photodissociation of NF2 has been investigated from 240–270 nm, using tunable UV radiation from a frequency upconverted YAG pumped dye laser system. The absorption cross section of NF2, and the photolysis quantum yield for the fragment NF(a1Δ) were measured with 0.25 cm−1 resolution. The NF(a1Δ) quantum yield decreases at longer wavelengths and is only 1% at 260 nm. This suggests that the first long wavelength band in NF2 leads primarily to ground state NF(X 3∑), and that the existence of a new higher lying NF2 electronic state is responsible for the NF(a1Δ) production.

  DOI：

  10.1063/1.453262

文献信息

• Generation of NBr( ) by the reaction of N3 radicals with Br atoms: a flow reactor source for quenching rate constant measurements
  作者：Kevin B Hewett、D.W Setser

  DOI：10.1016/s0009-2614(98)01116-6

  日期：1998.11

  The reaction between azide radicals (N3) and Br atoms is shown to produce electronically excited NBr() molecules in a room temperature flow reactor. This chemical system provides adequate concentration of NBr() so that this molecule can be systematically studied. The yield of NBr() is minor. The quenching reactions of NBr(a) with HCl, HBr, HI, NH3, Br2, CF2Br2, and O2 were examined; the rate constants

  叠氮基团（N 3）与Br原子之间的反应显示出在室温流动反应器中产生电子激发的NBr（）分子。该化学系统提供了足够的NBr（）浓度，因此可以系统地研究该分子。NBr（）的收率很小。研究了NBr（a）与HCl，HBr，HI，NH 3，Br 2，CF 2 Br 2和O 2的猝灭反应；速率常数为（22±5）×10 -14，（280±30）×10 -14，（2300±200）×10 -14，（35±3）×10 -14，（2600±300）× 10 -14，（37±6）×10 -14，和（230±30）×10 -14 cm 3分子-1 s -1。
• Possible reaction of atomic nitrogen with SFx (X = 1–5 and CFx (X = 1–3) fragments from N2SF6 and N2CF4 discharges
  作者：S.V.K. Kumar、N. Sathyamurthy、S. Manogaran、S.K. Mitra

  DOI：10.1016/0009-2614(94)00373-4

  日期：1994.5

  Possible reactions of atomic nitrogen with SFx (X = 1–5) and CFx (X = 1–3) fragments resulting from discharges in N2 an or CF4 have been investigated using the flowing afterglow technique. It is shown that only in N2&.sbnd;SF6 discharges neutral NF is formed, by recording its fluorescence from the b 1Σ+ state of NF, presumably arising from the excitation transfer from N2(A 3Σ+u) to NF. It is argued

  使用流动余辉技术研究了原子氮与N 2 an或CF 4中的放电导致的SF x（X = 1-5）和CF x（X = 1-3）碎片的可能反应。结果表明，仅在N- 2＆.sbnd; SF 6次的放电中性NF形成，通过从B记录其荧光1种Σ + NF的状态下，来自选自N激励传递想必引起2（A 3 Σ + ù）到NF。有人认为，反应产物NF完全是由SF 5的原子氮提取氟所致。
• Product branching in the CO+NF (a 1Δ) reaction
  作者：S. Wategaonkar、K.Y. Du、D.W. Setser

  DOI：10.1016/0009-2614(92)85255-9

  日期：1992.2

  The product channels for the NF(a 1Δ)+CO quenching reaction, either chemical reaction with formation of NCO+F or physical quenching with formation of NF(X 3Σ−)+CO, have been studied in a flow reactor at 300 K. Laser-induced fluorescence measurements of the NCO concentration show that the spin-conserving chemical reaction is the main pathway. The yield of NCO was calibrated from the stoichiometric F+HNCO

  产品通道的NF（一个1个Δ）+ CO猝灭反应，用形成的NCO + F或物理淬火与地层NF的任一化学反应（X 3 Σ -）+ CO，已经在流动反应器中在300研究K. NCO浓度的激光诱导荧光测量表明，自旋保守化学反应是主要途径。由化学计量的F + HNCO反应校准给出的HF + NCO的NCO的产率。
• Addition‐Elimination HF Chemical Laser
  作者：Thomas D. Padrick、George C. Pimentel

  DOI：10.1063/1.1654094

  日期：1972.2.15

  Hydrogen fluoride laser emission has been observed following flash photolysis of ethylene and tetrafluorohydrazine at elevated temperatures in a Vycor laser tube. The observed emission includes only v=1→0 transitions; we believe this emission is caused by HF elimination from a chemically activated molecule formed by addition to the ethylene double bond.

  在 Vycor 激光管中，在升高的温度下，乙烯和四氟肼发生闪光光解后，已经观察到氟化氢激光发射。观测到的发射仅包括 v=1→0 跃迁；我们相信这种发射是由通过添加到乙烯双键形成的化学活化分子中的 HF 消除引起的。
• Reactions forming electronically-excited free radicals. Part 2.—Formation of N⁴S, N²D and N²P atoms in the H + NF₂reaction, and N atom reactions
  作者：Chew Toong Cheah、Michael A. A. Clyne

  DOI：10.1039/f29807601543

  日期：——

  The kinetics of reactions (at 298 K) involving ground-state N 4S and excited-state N 2D, 2P atoms have been studied using resonance-fluorescence detection in a discharge-flow system. The N 4S+ NO reaction has been studied as a reference reaction: N 4S+ NO [graphic omitted] N2+ O; k1=(3.4 ± 0.3)× 10–11 cm3 molecule–1 s–1(1σ). Also, the rate constant k2 for the N 4S+ NF2 reaction has been determined:

  在放电流系统中使用共振荧光检测研究了涉及基态N 4 S和激发态N 2 D，2 P原子的反应动力学（在298 K下）。已经研究了N 4 S + NO反应作为参考反应：N 4 S + NO [省略图示] N 2 + O; k 1 =（3.4±0.3）×10 –11 cm 3分子–1 s –1（1σ）。另外，N 4 S + NF的速率常数k 2已确定2反应：N 4 S + NF 2 [图中省略] 2 NF; k 2 =（4.6±0.3）×10 –12 cm 3分子–1 s –1（ 1σ）。将反应ħ 2小号+ NF 2给出了NF的基团一个1个Δ状态与分支比0.9：H 2小号+ NF 2 →NF一个1 Δ+ HF X 1 Σ +。该结论是根据对N 4浓度分布的研究得出的。小号和N 2个d的状态下-选择性的反应原子（4一），（4 b）：H 2小号+ NF一个1 Δ→Ñ 2 d + HF X 1 Σ +（4一），H