2-hydroxymethylanthraquinone | 638128-47-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 2-hydroxymethylanthraquinone
• 英文别名: 1-(hydroxymethyl)anthracene-9,10-dione
• CAS: 638128-47-9
• 化学式: C₁₅H₁₀O₃
• 分子量: 238.243
• InChiKey: BMTMWCVGAVWDRA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  54.4
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1aHydroxya15,16adioxatetracyclo[7.7.1.02,7.013,17]heptadecaa2,4,6,9,11,13(17)ahexaena8aone 在 硫脲 、 水 、 sodium chloride 作用下， 以 乙醇 为溶剂， 以37.5 mg的产率得到2-hydroxymethylanthraquinone
  参考文献：
  名称：

  Photochemical Hydroxylation of 1-Methyl-9,10-anthraquinones: Synthesis of 9′-Hydroxyaloesaponarin II

  摘要：

  Photolysis of 1-methyl-9,10-anthraquinones in the presence of oxygen yields endoperoxides that can be reduced to produce 1-hydroxymethyl-9,10-anthraquinones. The reaction proceeds in a fashion similar to that or other o-alkylphenones which yield either a 1,4-diradical or a "photoenol" upon irradiation. Anthraquinones undergo photochemistry at a wavelength where the endoperoxide is transparent, allowing, its isolation. A singlet oxygen quencher had no effect on the rate of formation of the endoperoxide. The photochemical hydroxylation has been used in a total synthesis of a naturally occurring polyketide, 9'-hydroxyaloesaponarin II.

  DOI：

  10.1021/jo902247v

文献信息

• [EN] PROCESS FOR PREPARING 8-HYDROXY-9,10-DIOXO-ANTHRACENE-1-CARBOXYLIC ACID<br/>[FR] PROCÉDÉ DE PRÉPARATION D'ACIDE 8-HYDROXY-9,10-DIOXO-ANTHRACÈNE-1-CARBOXYLIQUE
  申请人：PILI

  公开号：WO2021156406A1

  公开（公告）日：2021-08-12

  The present invention relates to a process for preparing 8-hydroxy-9,10-dioxo-anthracene-1- carboxylic acid. It also relates to a method for preparing an anthraquinone derivative comprising a step for preparing 8-hydroxy-9,10-dioxo-anthracene-1-carboxylic acid according to such process.

  本发明涉及一种制备8-羟基-9,10-二氧基蒽-1-羧酸的方法。该发明还涉及一种制备蒽醌衍生物的方法，其中包括根据该方法制备8-羟基-9,10-二氧基蒽-1-羧酸的步骤。
• Thiol compound, photopolymerization initiator composition and photosensitive composition
  申请人：Katoh Tsuyoshi

  公开号：US20050153231A1

  公开（公告）日：2005-07-14

  A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

  一种光聚合引发剂组合物，包含一种含有巯基含有基团的硫醇化合物，该基团在α-和/或β-位置上的碳原子上至少有一个取代基，以及一种光聚合引发剂；一种含有该组合物的光敏组合物；以及一种新型硫醇化合物，用于这些组合物。含有本发明的光聚合引发剂组合物的光敏组合物具有高灵敏度和优异的储存稳定性，并能通过提高生产率降低成本。
• THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Ikeda Haruhiko

  公开号：US20100233596A1

  公开（公告）日：2010-09-16

  It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R 1 is a hydrogen atom or a methyl group, and R 2 is —CO—, —COO— or —COOR 3 — (wherein R 3 is an alkylene group of 2 to 6 carbon atoms).

  本发明的目的是提供一种具有高灵敏度和优异储存性能的光聚合引发剂组合物，一种包含该光聚合引发剂组合物的光敏组合物，以及一种对该光聚合引发剂组合物有利的硫脲酯化合物。本发明的硫脲酯化合物具有2到6个单位，每个单位包含以下式(i)和以下式(ii)所代表的基团。其中，R1是氢原子或甲基基团，R2是—CO—、—COO—或—COOR3—（其中R3是2到6个碳原子的烷基基团）。
• LHRH Analogs
  申请人：The Administrators of The Tulane Educational Fund

  公开号：EP0450461B1

  公开（公告）日：1995-09-06
• THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION
  申请人：SHOWA DENKO K.K.

  公开号：EP1478668A2

  公开（公告）日：2004-11-24