1,3-dihydroxy-4-(α-hydroxyhexafluoroisopropyl)benzene | 2092-88-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 1,3-dihydroxy-4-(α-hydroxyhexafluoroisopropyl)benzene
• 英文别名: 1-(Hexafluor-2-hyroxy-2-propyl)-2,4-dihydroxy-benzol；1-(1,1,1,3,3,3-Hexafluoro-2-hydroxy-2-propyl)-2,4-dihydroxybenzene；4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)benzene-1,3-diol
• CAS: 2092-88-8
• 化学式: C₉H₆F₆O₃
• 分子量: 276.135
• InChiKey: WZKKRYUJCYJBKS-UHFFFAOYSA-N

物化性质

• 熔点：
  142-144 °C(Solv: benzene (71-43-2))
• 沸点：
  342.9±42.0 °C(Predicted)
• 密度：
  1.655±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  nitropentafluoroacetone 、 1,3-dihydroxy-4-(α-hydroxyhexafluoroisopropyl)benzene 以 硝基甲烷 为溶剂， 反应 144.0h， 以99.9%的产率得到4-(2,2-Difluoro-1-hydroxy-2-nitro-1-trifluoromethyl-ethyl)-6-(2,2,2-trifluoro-1-hydroxy-1-trifluoromethyl-ethyl)-benzene-1,3-diol
  参考文献：
  名称：

  Reaction of nitropentafluoroacetone with phenols

  摘要：

  DOI：

  10.1007/bf00957186
• 作为产物：
  描述：

  六氟丙酮 、 间苯二酚 以 苯 为溶剂， 反应 2.0h， 以95%的产率得到1,3-dihydroxy-4-(α-hydroxyhexafluoroisopropyl)benzene
  参考文献：
  名称：

  Reactions of polyfluorocarbonyl compounds with polyphenols

  摘要：

  DOI：

  10.1007/bf00956353

文献信息

• Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
  申请人：Komoriya Haruhiko

  公开号：US20110244188A1

  公开（公告）日：2011-10-06

  Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

  本发明涉及一种可聚合的含氟单体，其通式（1）如下所示。其中，R1代表氢原子、甲基基团、氟原子或三氟甲基基团。n为0或1的整数，m为1至（3+n）的整数。R2和R3各自独立地代表氢原子或保护基团。通过聚合或共聚合该单体得到的含氟聚合物的抗蚀剂适用于浸润曝光或基于浸润曝光的双重图案化工艺的微细加工。
• Top Coat Composition
  申请人：Komoriya Haruhiko

  公开号：US20110245395A1

  公开（公告）日：2011-10-06

  Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R 2 or R 3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.

  公开了一种用于光刻胶的面漆组合物，其特征在于包含有一个由通式（5）表示的重复单元的氟化聚合物。在该式中，R1表示氢原子、甲基、氟原子或三氟甲基；n表示0或1；m表示1至（3+n）的整数；而R2或R3表示氢原子或保护基。该面漆组合物在显影液中具有适当的溶解度。
• Top coat composition
  申请人：Komoriya Haruhiko

  公开号：US08592508B2

  公开（公告）日：2013-11-26

  Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.

  本发明公开了一种用于光刻胶的面涂层组合物，其特征在于包含具有由通式（5）表示的重复单元的氟化聚合物。在该式中，R1表示氢原子、甲基、氟原子或三氟甲基基团；n表示0或1；m表示1到（3+n）的整数；而R2或R3表示氢原子或保护基团。该面涂层组合物在显影液中具有适当的溶解度。
• Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
  申请人：Komoriya Haruhiko

  公开号：US08716385B2

  公开（公告）日：2014-05-06

  Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

  本发明公开了一种由下列通式（1）表示的可聚合氟单体。在该式中，R1代表氢原子、甲基基团、氟原子或三氟甲基基团。n是0或1的整数，m是1到（3+n）的整数。R2和R3各自独立地表示氢原子或保护基团。通过聚合或共聚合单体得到的含氟聚合物的光刻胶适用于通过浸没曝光或基于浸没曝光的双重图案化工艺进行微细加工。
• DYACHENKO, V. I.;KOLOMIETS, A. F.;FOKIN, A. V., IZV. AN CCCP. CEP. XIM.,(1989) N, S. 1436-1440
  作者：DYACHENKO, V. I.、KOLOMIETS, A. F.、FOKIN, A. V.

  DOI：——

  日期：——