Cholate photoacid generators and photoresists comprising same
申请人:Rohm and Haas Electronic Materials LLC
公开号:EP2332960B1
公开(公告)日:2016-08-10
Photoacid generators and photoresists comprising same
申请人:Li Mingqi
公开号:US09255079B2
公开(公告)日:2016-02-09
New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.