申请人:Hoffmann-La Roche Inc.
公开号:US20160016963A1
公开(公告)日:2016-01-21
The present invention relates to compounds of general formula I
wherein
R
1
is halogen, lower alkyl, lower alkoxy, lower alkyl substituted by halogen, lower alkoxy substituted by halogen or cyano;
R
2
is hydrogen, CF
3
or lower alkyl;
R
3
is hydrogen, lower alkyl, lower alkenyl, lower alkinyl, heterocycloalkyl, lower alkyl substituted by cyano, cyano, benzyl substituted by halogen, 2-oxa-6-aza-spiro[3.3]hept-6-yl or is lower alkoxy substituted by halogen;
X is —CH
2
— or —CH
2
—CH
2
—;
or to a pharmaceutically acceptable acid addition salt, to a racemic mixture or to its corresponding enantiomer and/or optical isomers thereof.
The compounds may be used for the treatment of schizophrenia, obsessive-compulsive personality disorder, major depression, bipolar disorders, anxiety disorders, normal aging, epilepsy, retinal degeneration, traumatic brain injury, spinal cord injury, post-traumatic stress disorder, panic disorder, Parkinson's disease, dementia, Alzheimer's disease, mild cognitive impairment, chemotherapy-induced cognitive dysfunction, Down syndrome, autism spectrum disorders, hearing loss, tinnitus, spinocerebellar ataxia, amyotrophic lateral sclerosis, multiple sclerosis, Huntington's disease, stroke, radiation therapy, chronic stress, abuse of neuro-active drugs, such as alcohol, opiates, methamphetamine, phencyclidine and cocaine.
本发明涉及一般式I的化合物,其中R1为卤素,低碳基,低烷氧基,低碳基取代的卤素,低烷氧基取代的卤素或氰基; R2为氢,CF3或低碳基; R3为氢,低碳基,低烯基,低炔基,杂环烷基,低碳基取代的氰基,氰基,卤素取代的苄基,2-氧杂-6-氮-螺[3.3]庚-6-基或低烷氧基取代的卤素; X为-CH2-或-CH2-CH2-; 或其对应的对映体和/或光学异构体的药学上可接受的酸加合物或外消旋混合物。这些化合物可用于治疗精神分裂症、强迫性人格障碍、重度抑郁症、双相障碍、焦虑症、正常衰老、癫痫、视网膜退行性疾病、创伤性脑损伤、脊髓损伤、创伤后应激障碍、惊恐障碍、帕金森病、痴呆、阿尔茨海默病、轻度认知障碍、化疗引起的认知功能障碍、唐氏综合症、自闭症谱系障碍、听力损失、耳鸣、脊髓小脑性共济失调、肌萎缩性侧索硬化症、多发性硬化症、亨廷顿病、中风、放射治疗、慢性压力、神经活性药物滥用,如酒精、鸦片类、甲基苯丙胺、苯环利定和可卡因。