POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:HASEGAWA Koji
公开号:US20130017484A1
公开(公告)日:2013-01-17
Polymerizable ester compounds having formula (1) are novel wherein R
1
is H, F, methyl or trifluoromethyl, R
2
is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k
1
is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.
具有式(1)的可聚合酯化合物是新颖的,其中R1为H、F、甲基或三氟甲基,R2为酸敏感基团,Aa为二价的碳氢基团,可以通过—O—或—C(═O)—分离,k1为0或1。它们可用作单体,用于生产对辐射≦500 nm透明的聚合物。以这些聚合物作为基础树脂的辐射敏感抗蚀剂组合物表现出优异的显影性能。