Block copolymers and pattern treatment compositions and methods
申请人:Rohm and Haas Electronic Materials LLC
公开号:US10042255B2
公开(公告)日:2018-08-07
Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.
BLOCK COPOLYMERS AND PATTERN TREATMENT COMPOSITIONS AND METHODS
申请人:Rohm and Haas Electronic Materials LLC
公开号:US20170123316A1
公开(公告)日:2017-05-04
Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.