(4-Cyclohexyl-phenyl)-methacrylat | 60494-23-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: (4-Cyclohexyl-phenyl)-methacrylat
• 英文别名: (4-Cyclohexylphenyl) 2-methylprop-2-enoate
• CAS: 60494-23-7
• 化学式: C₁₆H₂₀O₂
• 分子量: 244.334
• InChiKey: HERVEWIIWZKCRT-UHFFFAOYSA-N

物化性质

• 沸点：
  365.1±12.0 °C(Predicted)
• 密度：
  1.034±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.44
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  甲基丙烯酰氯 、 对环己基苯酚 生成 (4-Cyclohexyl-phenyl)-methacrylat
  参考文献：
  名称：

  Esters of methacrylic acid

  摘要：

  公开号：

  US02129685A1

文献信息

• LIGHT ABSORPTIVE COMPOUND, POLYMER COMPOSITION CONTAINING THE COMPOUND, POLYMER FILM, AND CURED LAYER
  申请人：Sumitomo Chemical Company, Limited

  公开号：US20170183304A1

  公开（公告）日：2017-06-29

  The object of the present invention is to provide a light absorptive compound which is capable of selectively absorbing light around a wavelength of 400 nm, and is excellent in solubility in various solvents and/or affinity with hydrophobic substances. Also, the object of the present invention is to provide an optical film containing such a light absorptive compound, and a cured layer. A compound represented by the following formula (I):

  本发明的目的是提供一种能够选择性吸收波长约为400纳米附近光线的光吸收化合物，具有在各种溶剂中良好的溶解性和/或与疏水性物质的亲和性。此外，本发明的目的是提供一种含有这种光吸收化合物的光学膜和固化层。由以下式（I）表示的化合物：
• COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
  申请人：JSR Corporation

  公开号：EP1235104A1

  公开（公告）日：2002-08-28

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：（A）可分解化合物；（B）折射率低于可分解化合物（A）的不可分解化合物；（C）对辐射敏感的分解剂；以及（D）稳定剂。通过图案掩膜将组合物暴露在辐射下，暴露部分的上述成分（C）和（A）被分解，暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• Radiation sensitive refractive index changing composition and refractive index changing method
  申请人：JSR Corporation

  公开号：EP1323742A2

  公开（公告）日：2003-07-02

  A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

  一种辐射敏感折射率改变组合物，其材料的折射率可通过简单的方法改变，改变后的折射率差足够大，并且无论使用条件如何，都能提供稳定的折射率图案和稳定的光学材料。 辐射敏感折射率变化组合物包括：(A) 可聚合化合物；(B) 折射率低于可聚合化合物 (A) 聚合物的不可聚合化合物；(C) 辐射敏感聚合引发剂。
• RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX
  申请人：JSR Corporation

  公开号：EP1350814A1

  公开（公告）日：2003-10-08

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：(A) 可分解化合物；(B) 折射率高于可分解化合物(A)的不可分解化合物；(C) 对辐射敏感的分解剂；(D) 稳定剂。通过图案掩膜将这种组合物暴露在辐射下，暴露部分的上述成分（C）和（A）分解，在暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION
  申请人：JSR Corporation

  公开号：EP1369459A1

  公开（公告）日：2003-12-10

  A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

  一种形成折射率图案或光学材料的方法，无论使用条件如何，它都能保持稳定，并能通过简单的方法提供足够大的折射率变化。 折射率图案或光学材料的形成方法是：将由 (A) 可分解化合物、(B) 含无机氧化物颗粒的不可分解化合物和 (C) 辐射敏感分解物组成的折射率变化组合物暴露于辐射中，然后用 (D) 稳定剂处理。