X-ray structures and photophysical properties of Tris(1-naphthyl)silicon(IV) derivatives
作者:Kisturi Dhanwant、Tristram Chivers、M. Bhanuchandra、Ramalingam Thirumoorthi
DOI:10.1016/j.molstruc.2020.128650
日期:2020.11
Abstract Silyl-substituted naphthalene derivatives, tris(1-napthyl)silicon (IV) chloride (1), tris(1-napthyl)silicon (IV) hydroxide (2) and tris(1-napthyl)silicon (IV)-n-butoxide (3) have been structurally characterized by single-crystal X-ray diffraction. The close intermolecular proximity of the naphthyl substituents groups in 1–3 results in a variety of C–H---π intermolecular interactions to form
摘要 甲硅烷基取代的萘衍生物、三(1-萘基)硅(IV)氯化物(1)、三(1-萘基)硅(IV)氢氧化物(2)和三(1-萘基)硅(IV)-n-丁醇盐 (3) 已通过单晶 X 射线衍射进行结构表征。1-3 中萘基取代基的分子间接近导致各种 C-H---π 分子间相互作用形成二维组装。1-3 的 UV-vis 光谱显示红移(红色),并且相对于未取代的萘,消光系数增加。量子产率计算表明,相对于 1-三甲基甲硅烷基萘,1-3 的荧光发射效率显着降低。