Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state
29
Si,
19
F, and
13
C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF
2
groups as repeat units.
热丝
化学气相沉积法用于沉积由碳
氟化合物和
硅氧烷基团组成的共聚物薄膜。薄膜中碳
氟化合物和有机
硅分子之间共价键的存在已通过红外、X 射线光电子(XPS)和固态
29
硅、
19
F 和
13
核磁共振(NMR)光谱。薄膜结构由带有线性和环状
硅氧烷基团的链和 CF
2
基团作为重复单元组成的链。