t-butyl lithocholate | 169965-90-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 类固醇和类固醇衍生物
• 英文名称: t-butyl lithocholate
• 英文别名: lithocholic acid tert-butyl ester；tert-butyl lithocholate；(R)-tert-Butyl 4-((3R,5R,8R,9S,10S,13R,14S,17R)-3-hydroxy-10,13-dimethylhexadecahydro-1H-cyclopenta[a]phenanthren-17-yl)pentanoate；tert-butyl (4R)-4-[(3R,5R,8R,9S,10S,13R,14S,17R)-3-hydroxy-10,13-dimethyl-2,3,4,5,6,7,8,9,11,12,14,15,16,17-tetradecahydro-1H-cyclopenta[a]phenanthren-17-yl]pentanoate
• CAS: 169965-90-6
• 化学式: C₂₈H₄₈O₃
• 分子量: 432.687
• InChiKey: JFKNTFDMIVXSIA-CUYCEIPOSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.6
• 重原子数：
  31
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.96
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  t-butyl lithocholate 在 lithium cyclohexyl(2,6-diisopropylphenyl)amide 、 zinc(II) chloride 、 bis(η3-allyl-μ-chloropalladium(II)) 、 allyl t-butyl carbonate 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 18.0h， 以77%的产率得到
  参考文献：
  名称：

  α,β-Dehydrogenation of esters with free O H and N H functionalities via allyl-palladium catalysis

  摘要：

  A direct and selective method for the alpha,beta-dehydrogenation of esters using palladium catalysis in the presence of free O-H and N-H functionalities is reported herein. Allyl-palladium catalysis allows for preservation of readily oxidizable functionalities such as amines and alcohols. Furthermore, an economical protocol using LDA was developed for the dehydrogenation of beta-amino esters. (C) 2018 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2018.02.028
• 作为产物：
  描述：

  石胆酸 在 吡啶 、 4-二甲氨基吡啶 、 sodium methylate 、 N,N'-二环己基碳二亚胺 作用下， 以 甲醇 、 二氯甲烷 为溶剂， 反应 7.5h， 生成 t-butyl lithocholate
  参考文献：
  名称：

  Lithocholic acid analogues, new and potent α-2,3-sialyltransferase inhibitors

  摘要：

  一种新型非竞争性α-2,3-唾液酸转移酶抑制剂已被合成；我们报告了十六种石胆酸类似物的发现、制备及其抑制活性。

  DOI：

  10.1039/b514915k

文献信息

• Practical and Modular Construction of C(sp³)-Rich Alkyl Boron Compounds
  作者：Yangyang Yang、Jet Tsien、Ayala Ben David、Jonathan M. E. Hughes、Rohan R. Merchant、Tian Qin

  DOI：10.1021/jacs.0c11964

  日期：2021.1.13

  Alkyl boronic acids and esters play an important role in the synthesis of C(sp3)-rich medicines, agrochemicals, and material chemistry. This work describes a new type of transition-metal-free mediated transformation to enable the construction of C(sp3)-rich and sterically hindered alkyl boron reagents in a practical and modular manner. The broad generality and functional group tolerance of this method

  烷基硼酸和酯在富含 C(sp3) 的药物、农用化学品和材料化学的合成中起着重要作用。这项工作描述了一种新型的无过渡金属介导的转化，能够以实用和模块化的方式构建富含 C(sp3) 和空间位阻的烷基硼试剂。通过各种底物，包括与药物化学相关的支架的合成和后期功能化，对该方法的广泛通用性和官能团耐受性进行了广泛检查。这种以烷基硼酸为关键的方法的战略意义通过烷基硼化合物的各种下游功能化得到证明。这种两步并行交叉偶联方法，类似于正式和灵活的烷基-烷基偶联，
• NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20090246694A1

  公开（公告）日：2009-10-01

  Photoacid generators generate sulfonic acids of formula ( 1 a) upon exposure to high-energy radiation. ROC(═O)R 1 —COOCH 2 CF 2 SO 3 − H + (1a) RO is OH or C 1 -C 20 organoxy, R 1 is a divalent C 1 -C 20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）的磺酸。 ROC(═O)R1—COOCH2CF2SO3−H+(1a) RO为OH或C1-C20有机氧基，R1为二价的C1-C20脂肪族基团或与RO形成环状结构。这些光酸发生剂与树脂相容，可以控制酸的扩散，因此适用于化学增感抗蚀组合物的使用。
• Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
  申请人：Feiring E. Andrew

  公开号：US20060167284A1

  公开（公告）日：2006-07-27

  The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

  本发明提供了一种新型的含氟共聚物，其包括至少一种含氟烯烃，至少一种具有融合的4-成员杂环环的多环乙烯不饱和单体，以及可选的其他组分。这些共聚物对于光刻成分特别是用于半导体器件生产中成像的光刻成分（正作用和/或负作用）非常有用。这些共聚物在具有高紫外透明度的光刻成分中特别有用（特别是在短波长，例如157纳米处），这些光刻成分可用作光刻胶的基础树脂，并且潜在地在许多其他应用中也很有用。
• Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
  申请人：DiPietro A. Richard

  公开号：US20060287558A1

  公开（公告）日：2006-12-21

  Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R 1 , R 2 , R 3 , R 4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

  提供具有结构式（I）的氟化乙烯醚，其中结构式（I）中的X和Y中至少有一个是氟原子，而L、R1、R2、R3、R4如本文所定义。还提供由（I）和可能不是氟化的第二单体进行自由基聚合制备的共聚物。这些聚合物在光刻光阻组合物中很有用，特别是化学放大光阻。在一个首选实施例中，这些聚合物对深紫外（DUV）辐射几乎透明，因此在DUV光刻光阻组合物中很有用。还提供一种使用该组合物在基板上生成抗蚀图像的方法，即在集成电路或类似产品的制造中。
• NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20090061358A1

  公开（公告）日：2009-03-05

  Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. R 1 —COOCH(CF 3 )CF 2 SO 3 + H + (1a) R 1 —O—COOCH(CF 3 )CF 2 SO 3 − H + (1c) R 1 is a C 20 -C 50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生剂在高能辐射作用下生成式（1a）或（1c）的磺酸。R1—COOCH(CF3)CF2SO3+H+(1a)R1—O—COOCH(CF3)CF2SO3−H+(1c)R1是具有类固醇结构的C20-C50烃基。这些光酸发生剂与树脂相容，可以控制酸的扩散，因此适用于化学增感抗蚀组合物的使用。