A photoacid generator compound has formula (I):
G
+
Z
−
(I)
wherein G has formula (II):
In formula (II), X is S or I, each R
0
is commonly attached to X and is independently C
1-30
alkyl; polycyclic or monocyclic C
3-30
cycloalkyl; polycyclic or monocyclic C
6-30
aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R
0
groups are further attached to an adjacent R
0
group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.
一种光酸发生剂化合物具有以下式(I):G+Z−(I),其中G具有以下式(II):
在式(II)中,X为S或I,每个R0通常连接到X,并且独立地为C1-30烷基;多环或单环的C3-30环烷基;多环或单环的C6-30芳基;或包含至少其中一种上述基团的组合。G的分子量大于263.4克/摩尔,或小于263.4克/摩尔。一个或多个R0基团进一步连接到相邻的R0基团,a为2或3,其中当X为I时,a为2,或当X为S时,a为2或3。式(I)中的Z包括
磺酸盐、磺
酰亚胺或磺酰胺的阴离子。光阻剂和涂层膜还包括该光酸发生剂,并且形成电子器件的方法使用该光阻剂。