Preparation of Nano Silica Supported Sodium Hydrogen Sulfate: As an Efficient Catalyst for the Trimethyl, Triethyl and<i>t</i>-Butyldimethyl Silylations of Aliphatic and Aromatic Alcohols in Solution and under Solvent-free Conditions
作者:Abdolreza Abri、Somayeh Ranjdar
DOI:10.1002/jccs.201300586
日期:2014.8
Nano silicasupportedsodiumhydrogensulfate has been prepared by mixing NaHSO4 with activated Nano silicagel. We wish to report a new method for the synthesis of trimethyl (TMS), triethyl (TES) and t‐butyldimethyl silyl (TBS) ethers from benzylic, allylic, propargylic alcohols, phenols, naphtholes and some of phenolic drugs in the solution and under solvent‐free conditions.
Photo Lewis acid generators: photorelease of B(C<sub>6</sub>F<sub>5</sub>)<sub>3</sub> and applications to catalysis
作者:Andrey Y. Khalimon、Bryan K. Shaw、Adam J. V. Marwitz、Warren E. Piers、James M. Blackwell、Masood Parvez
DOI:10.1039/c5dt03008k
日期:——
A series of molecules capable of releasing of the strong organometallic LewisacidB(C6F5)3 upon exposure to 254 nm light have been developed. These photo Lewisacid generators (PhLAGs) can now serve as photoinitiators for several important B(C6F5)3-catalyzed reactions. Herein is described the synthesis of the triphenylsulfonium and diphenyliodonium salts of carbamato- and hydridoborates, their establishment
已经开发出了一系列能够在暴露于254 nm的光后释放出强有机金属路易斯酸B(C 6 F 5)3的分子。这些光路易斯酸产生剂(PhLAG)现在可以用作几个重要的B(C 6 F 5)3催化反应的光引发剂。本文描述了氨基甲酸酯和氢硼酸酯的三苯基s盐和二苯基碘鎓盐的合成,它们作为PhLAG的建立以及旨在确定硼烷释放机理的研究。还讨论了影响这些光解反应的因素以及该概念在光诱导的氢化硅烷化反应中的应用以及硅氧烷支架的构建。
One-Step Conversion of Formate Esters to O-Silyl Ethers by Means of Samarium Diiodide in the Presence of Chlorosilane Reagents
作者:Toshio Honda、Fumihiro Ishikawa
DOI:10.1080/00397919908085960
日期:1999.10
Abstract One-step conversion of various types of formate esters into the corresponding O-silyl ethers under neutral reaction conditions was established by employing samarium diiodide in the presence of chlorosilane reagents.
[EN] METHODS AND COMPOUNDS FOR PHOTO LEWIS ACID GENERATION AND USES THEREOF<br/>[FR] PROCÉDÉS ET COMPOSÉS POUR LA PHOTOGÉNÉRATION D'ACIDES DE LEWIS ET LEURS UTILISATIONS
申请人:UTI LIMITED PARTNERSHIP
公开号:WO2013142956A1
公开(公告)日:2013-10-03
There are disclosed masked Lewis acids into compounds in which the Lewis acid can be released by exposure of the compound to light, especially ultraviolet light. These compounds can be represented by the following formula (I): ([(AEX(3-n))(n+1)Yn](n+1)-)m(Qm+)(n+1) (I). wherein briefly, E represents boron or aluminium, X is an aryl group and Y is -Ar'EAX,. These compounds are used as catalyst for hydrosilylation reaction, crosslinking of polymers, or ester deprotection reactions as photo Lewis acid generator (PhLAG).
An efficient method for the dehydrogenative coupling of silanes with alcohols under photocatalysis was developed. The reaction proceeded in the presence of Ru(bpy)3Cl2 (0.5 mol%) under visible light irradiation in acetonitrile at room temperature. The developed methodology was also applicable for the synthesis of silanols using water as a coupling partner.