The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
本发明提供了新型共聚物以及含有此类共聚物作为
树脂粘合剂成分的光刻胶组合物。优选的共聚物包括三种不同的重复单元:1)含有酸性基团的单元;2)不含活性和羟基的单元;3)有助于含有共聚物作为
树脂粘合剂的光刻胶的
水性显影性的单元。本发明的光刻胶显示出惊人的光刻性能改进,包括大大增强的抗等离子刻蚀性能和隔离线性能,以及良好的溶解速率控制。