BARBERO M.; CADAMURO S.; CERUTI M.; DEGANI I.; FOCHI R.; REGONDI V., GAZZ. CHIM. ITAL., 117,(1987) N 4, 227-235
作者:BARBERO M.、 CADAMURO S.、 CERUTI M.、 DEGANI I.、 FOCHI R.、 REGONDI V.
DOI:——
日期:——
POLYMERIZABLE COMPOSITION, FILM, AND HALF MIRROR FOR DISPLAYING PROJECTION IMAGE
申请人:FUJIFILM Corporation
公开号:US20170349828A1
公开(公告)日:2017-12-07
The present invention provides a polymerizable composition containing a polymerizable liquid crystal compound represented by Formula (I) and an oxime compound,
in the formula, A
1
and A
2
each represent a phenylene group or a trans-1,4-cyclohexylene group, L
1
and L
2
each represent single bond, —C(═O)O—, or —OC(═O)—, Q
1
and Q
2
each represent a polymerizable group or the like, m and n represent an integer of 0 to 2, X may represent —X
3
-Sp
3
-Q
3
or two X's may be bonded to each other to form a fused ring, X
3
represents —C(═O)O—, Sp
1
, Sp
2
, and Sp
3
each represent single bond, an alkylene group, or the like, Q
3
represents hydrogen atom, a cycloalkyl group, a polymerizable group, or the like, and l represents an integer of 0 to 4. The polymerizable composition hardly causes yellowing after curing and is useful for manufacturing a film and a half mirror for displaying a projection image.
COMPOSITION FOR FORMING PATTERN, KIT, CURED FILM, LAMINATE, PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT
申请人:FUJIFILM Corporation
公开号:US20220009153A1
公开(公告)日:2022-01-13
Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.