Bis(3,4-dichlorophenyl)iodanium

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Bis(3,4-dichlorophenyl)iodanium
• 化学式: C12H6Cl4I+
• 分子量: 418.9
• InChiKey: BLYWFUIBJQQHIJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.4
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。
• Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt
  申请人：Nagamori Masashi

  公开号：US20110112306A1

  公开（公告）日：2011-05-12

  A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.]

  提供一种含氟磺酸盐或含有含氟磺酸基团的化合物，其结构由下列通式（1）表示。这种盐或化合物可以作为合适的光酸发生剂，并且可以形成具有优异敏感度、分辨率和掩模依赖性的光阻图案。[在通式（1）中，R代表取代或未取代的具有1至30个碳原子的线性或支链一价碳氢基团，取代或未取代的具有3至30个碳原子且具有环状或部分环状结构的一价碳氢基团，取代或未取代的具有6至30个碳原子的芳基团，或取代或未取代的具有4至30个碳原子的一价杂环有机基团。]
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130078579A1

  公开（公告）日：2013-03-28

  A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R 1 represents a monovalent organic group having 1 to 20 carbon atoms. R 2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R 2 is as defined in the above formula (1). X represents an electron attractive group. R 3 represents a monovalent organic group having 1 to 20 carbon atoms.

  一种辐射敏感的树脂组合物，包括一个酸发生剂，通过辐射放射线产生下式（1）所代表的化合物。在式（1）中，R1代表具有1至20个碳原子的一价有机基团。R2代表氢原子或具有1至20个碳原子的一价有机基团。式（1）所代表的化合物最好是由下式（1-1）所代表的化合物。在式（1-1）中，R2如上式（1）所定义。X代表电子吸引基团。R3代表具有1至20个碳原子的一价有机基团。
• POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN
  申请人：Nagai Tomoki

  公开号：US20100063232A1

  公开（公告）日：2010-03-11

  A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n is an integer from 1 to 5.

  以下是翻译结果： 一种包括以下公式（10）所示的重复单元的树脂具有出色的辐射敏感酸发生剂性能，对环境和人体只有很小的负面影响。其中，R1代表氢原子或类似物，M+代表特定的阳离子，n为1至5的整数。
• COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：Ebata Takuma

  公开号：US20100221659A1

  公开（公告）日：2010-09-02

  A compound has a partial structure shown by a following formula (1), wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.

  以下是化合物的部分结构式（1），其中R1代表氢原子或具有1至8个碳原子的取代或未取代的碳氢基团，R2代表具有1至8个碳原子的取代或未取代的碳氢基团，Rf代表氟原子或具有1至4个碳原子的全氟烷基团，L表示从0到4的整数，n表示从0到10的整数，m表示从1到4的整数。